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Pan, Tung-Ming, Lee, Jian-Der, Shu, Wei-Hao, Chen, Tsung-Te (2006) Structural and electrical properties of neodymium oxide high-k gate dielectrics. Applied Physics Letters, 89 (23). 232908pp. doi:10.1063/1.2402237

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Reference TypeJournal (article/letter/editorial)
TitleStructural and electrical properties of neodymium oxide high-k gate dielectrics
JournalApplied Physics Letters
AuthorsPan, Tung-MingAuthor
Lee, Jian-DerAuthor
Shu, Wei-HaoAuthor
Chen, Tsung-TeAuthor
Year2006 (December 4)Volume89
Issue23
PublisherAIP Publishing
DOIdoi:10.1063/1.2402237Search in ResearchGate
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Mindat Ref. ID8551213Long-form Identifiermindat:1:5:8551213:5
GUID0
Full ReferencePan, Tung-Ming, Lee, Jian-Der, Shu, Wei-Hao, Chen, Tsung-Te (2006) Structural and electrical properties of neodymium oxide high-k gate dielectrics. Applied Physics Letters, 89 (23). 232908pp. doi:10.1063/1.2402237
Plain TextPan, Tung-Ming, Lee, Jian-Der, Shu, Wei-Hao, Chen, Tsung-Te (2006) Structural and electrical properties of neodymium oxide high-k gate dielectrics. Applied Physics Letters, 89 (23). 232908pp. doi:10.1063/1.2402237
In(2006, December) Applied Physics Letters Vol. 89 (23) AIP Publishing

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Pan, Tung-Ming, Lee, Jian-Der, Yeh, Wen-Wei (2007) Influence of oxygen content on the structural and electrical characteristics of thin neodymium oxide gate dielectrics. Journal of Applied Physics, 101 (2). 24110pp. doi:10.1063/1.2426937
Pan, Tung-Ming, Chen, Chun-Lin, Yeh, Wen Wei, Hou, Sung-Ju (2006) Structural and electrical characteristics of thin erbium oxide gate dielectrics. Applied Physics Letters, 89 (22). 222912pp. doi:10.1063/1.2399938
Pan, Tung-Ming, Shu, Wei-Hao, Hong, Jia-Liang (2007) Structural and electrical characteristics of Er2TiO5 gate dielectrics. Applied Physics Letters, 90 (22). 222906pp. doi:10.1063/1.2744486
Pan, Tung-Ming, Shu, Wei-Hao (2008) Influence of Neodymium Content on Structural Properties and Electrical Characteristics of High-k NdTiO[sub 3] Gate Dielectrics. Journal of the Electrochemical Society, 155. doi:10.1149/1.2835213
Pan, Tung-Ming, Shu, Wei-Hao (2007) Structural and electrical characteristics of a high-k NdTiO3 gate dielectric. Applied Physics Letters, 91 (17). 172904pp. doi:10.1063/1.2800307
Pan, Tung-Ming, Chang, Wei-Tsung, Chiu, Fu-Chien (2011) Structural properties and electrical characteristics of high-k Dy2O3 gate dielectrics. Applied Surface Science, 257. 3964-3968 doi:10.1016/j.apsusc.2010.11.144
Pan, Tung-Ming, Liao, Chao-Sung, Hsu, Hui-Hsin, Chen, Chun-Lin, Lee, Jian-Der, Wang, Kuan-Ti, Wang, Jer-Chyi (2005) Excellent frequency dispersion of thin gadolinium oxide high-k gate dielectrics. Applied Physics Letters, 87 (26). 262908pp. doi:10.1063/1.2152107
Pan, Tung-Ming, Yen, Li-Chen (2010) Structural properties and electrical characteristics of high-k Tm2Ti2O7 gate dielectrics. Applied Surface Science, 256. 1845-1848 doi:10.1016/j.apsusc.2009.10.017
Pan, Tung-Ming, Hou, Sung-Ju (2008) Effect of postdeposition annealing on the interfacial and electrical properties of high-k NdOxNy gate dielectrics. Applied Physics Letters, 92 (7). 72907pp. doi:10.1063/1.2884333
Pan, Tung-Ming, Lee, Jian-Der (2007) Physical and Electrical Properties of Yttrium Oxide Gate Dielectrics on Si Substrate with NH[sub 3] Plasma Treatment. Journal of the Electrochemical Society, 154. doi:10.1149/1.2742808
Pan, Tung-Ming (2006) Excellent electrical and reliability characteristics of 11Γ… oxynitride gate dielectrics by remote plasma nitridation treatment. Applied Physics Letters, 88 (11). 112904pp. doi:10.1063/1.2185612
 
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