Kubota, Tomohiro, Hashimoto, Takeshi, Ishikawa, Yasushi, Samukawa, Seiji, Miura, Atsushi, Uraoka, Yukiharu, Fuyuki, Takashi, Takeguchi, Masaki, Nishioka, Kensuke, Yamashita, Ichiro (2006) Charging and Coulomb staircase effects in silicon nanodisk structures fabricated by defect-free Cl neutral beam etching process. Applied Physics Letters, 89 (23). 233127pp. doi:10.1063/1.2404608
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Charging and Coulomb staircase effects in silicon nanodisk structures fabricated by defect-free Cl neutral beam etching process | ||
Journal | Applied Physics Letters | ||
Authors | Kubota, Tomohiro | Author | |
Hashimoto, Takeshi | Author | ||
Ishikawa, Yasushi | Author | ||
Samukawa, Seiji | Author | ||
Miura, Atsushi | Author | ||
Uraoka, Yukiharu | Author | ||
Fuyuki, Takashi | Author | ||
Takeguchi, Masaki | Author | ||
Nishioka, Kensuke | Author | ||
Yamashita, Ichiro | Author | ||
Year | 2006 (December 4) | Volume | 89 |
Issue | 23 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.2404608Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 8551279 | Long-form Identifier | mindat:1:5:8551279:1 |
GUID | 0 | ||
Full Reference | Kubota, Tomohiro, Hashimoto, Takeshi, Ishikawa, Yasushi, Samukawa, Seiji, Miura, Atsushi, Uraoka, Yukiharu, Fuyuki, Takashi, Takeguchi, Masaki, Nishioka, Kensuke, Yamashita, Ichiro (2006) Charging and Coulomb staircase effects in silicon nanodisk structures fabricated by defect-free Cl neutral beam etching process. Applied Physics Letters, 89 (23). 233127pp. doi:10.1063/1.2404608 | ||
Plain Text | Kubota, Tomohiro, Hashimoto, Takeshi, Ishikawa, Yasushi, Samukawa, Seiji, Miura, Atsushi, Uraoka, Yukiharu, Fuyuki, Takashi, Takeguchi, Masaki, Nishioka, Kensuke, Yamashita, Ichiro (2006) Charging and Coulomb staircase effects in silicon nanodisk structures fabricated by defect-free Cl neutral beam etching process. Applied Physics Letters, 89 (23). 233127pp. doi:10.1063/1.2404608 | ||
In | (2006, December) Applied Physics Letters Vol. 89 (23) AIP Publishing |
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