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Lin, Gong-Ru, Lin, Chun-Jung, Kuo, Hao-Chung, Lin, Huang-Sheng, Kao, Chi-Chiang (2007) Anomalous microphotoluminescence of high-aspect-ratio Si nanopillars formatted by dry-etching Si substrate with self-aggregated Ni nanodot mask. Applied Physics Letters, 90 (14). 143102pp. doi:10.1063/1.2719152

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Reference TypeJournal (article/letter/editorial)
TitleAnomalous microphotoluminescence of high-aspect-ratio Si nanopillars formatted by dry-etching Si substrate with self-aggregated Ni nanodot mask
JournalApplied Physics Letters
AuthorsLin, Gong-RuAuthor
Lin, Chun-JungAuthor
Kuo, Hao-ChungAuthor
Lin, Huang-ShengAuthor
Kao, Chi-ChiangAuthor
Year2007 (April 2)Volume90
Issue14
PublisherAIP Publishing
DOIdoi:10.1063/1.2719152Search in ResearchGate
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Mindat Ref. ID8553224Long-form Identifiermindat:1:5:8553224:5
GUID0
Full ReferenceLin, Gong-Ru, Lin, Chun-Jung, Kuo, Hao-Chung, Lin, Huang-Sheng, Kao, Chi-Chiang (2007) Anomalous microphotoluminescence of high-aspect-ratio Si nanopillars formatted by dry-etching Si substrate with self-aggregated Ni nanodot mask. Applied Physics Letters, 90 (14). 143102pp. doi:10.1063/1.2719152
Plain TextLin, Gong-Ru, Lin, Chun-Jung, Kuo, Hao-Chung, Lin, Huang-Sheng, Kao, Chi-Chiang (2007) Anomalous microphotoluminescence of high-aspect-ratio Si nanopillars formatted by dry-etching Si substrate with self-aggregated Ni nanodot mask. Applied Physics Letters, 90 (14). 143102pp. doi:10.1063/1.2719152
In(2007, April) Applied Physics Letters Vol. 90 (14) AIP Publishing


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