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Hopf, C., Schlüter, M., Jacob, W. (2007) Chemical sputtering of carbon films by argon ions and molecular oxygen at cryogenic temperatures. Applied Physics Letters, 90 (22). 224106pp. doi:10.1063/1.2745267

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Reference TypeJournal (article/letter/editorial)
TitleChemical sputtering of carbon films by argon ions and molecular oxygen at cryogenic temperatures
JournalApplied Physics Letters
AuthorsHopf, C.Author
Schlüter, M.Author
Jacob, W.Author
Year2007 (May 28)Volume90
Issue22
PublisherAIP Publishing
DOIdoi:10.1063/1.2745267Search in ResearchGate
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Mindat Ref. ID8554408Long-form Identifiermindat:1:5:8554408:2
GUID0
Full ReferenceHopf, C., Schlüter, M., Jacob, W. (2007) Chemical sputtering of carbon films by argon ions and molecular oxygen at cryogenic temperatures. Applied Physics Letters, 90 (22). 224106pp. doi:10.1063/1.2745267
Plain TextHopf, C., Schlüter, M., Jacob, W. (2007) Chemical sputtering of carbon films by argon ions and molecular oxygen at cryogenic temperatures. Applied Physics Letters, 90 (22). 224106pp. doi:10.1063/1.2745267
In(2007, May) Applied Physics Letters Vol. 90 (22) AIP Publishing

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Jacob, W., Hopf, C., Schlüter, M. (2005) Chemical sputtering of carbon by nitrogen ions. Applied Physics Letters, 86 (20). 204103pp. doi:10.1063/1.1931820
Hopf, C, Schlüter, M, Schwarz-Selinger, T, von Toussaint, U, Jacob, W (2008) Chemical sputtering of carbon films by simultaneous irradiation with argon ions and molecular oxygen. New Journal of Physics, 10. 93022pp. doi:10.1088/1367-2630/10/9/093022
Schlüter, M, Hopf, C, Jacob, W (2008) Chemical sputtering of carbon by combined exposure to nitrogen ions and atomic hydrogen. New Journal of Physics, 10. 53037pp. doi:10.1088/1367-2630/10/5/053037
Hopf, C, Schlüter, M, Jacob, W (2008) Chemical sputtering of a-C:H films by simultaneous exposure to energetic Ar+ions and water vapor. Journal of Physics: Conference Series, 100. 62012pp. doi:10.1088/1742-6596/100/6/062012
Schlüter, M., Hopf, C., Schwarz-Selinger, T., Jacob, W. (2008) Temperature dependence of the chemical sputtering of amorphous hydrogenated carbon films by hydrogen. Journal of Nuclear Materials, 376 (1). 33-37 doi:10.1016/j.jnucmat.2008.02.002
Hopf, C., von Keudell, A., Jacob, W. (2003) Chemical sputtering of hydrocarbon films. Journal of Applied Physics, 94 (4). 2373-2380 doi:10.1063/1.1594273
Hu, A., Griesing, S., Rybachuk, M., Lu, Q.-B., Duley, W. W. (2007) Nanobuckling and x-ray photoelectron spectra of carbyne-rich tetrahedral carbon films deposited by femtosecond laser ablation at cryogenic temperatures. Journal of Applied Physics, 102 (7). 74311pp. doi:10.1063/1.2786708
Rozgonyi, G. A., Polito, W. J. (1966) PREPARATION OF ZnO THIN FILMS BY SPUTTERING OF THE COMPOUND IN OXYGEN AND ARGON. Applied Physics Letters, 8 (9). 220-221 doi:10.1063/1.1754564
Ku, C. S., Chou, W. C., Lee, M. C. (2007) Optical investigations of InN nanodots capped by GaN at different temperatures. Applied Physics Letters, 90 (13). 132116pp. doi:10.1063/1.2716347
Srinivasan, Kartik, Painter, Oskar (2007) Optical fiber taper coupling and high-resolution wavelength tuning of microdisk resonators at cryogenic temperatures. Applied Physics Letters, 90 (3). 31114pp. doi:10.1063/1.2431719
Fan, John C. C. (1979) Preparation of Sn‐doped In2O3(ITO) films at low deposition temperatures by ion‐beam sputtering. Applied Physics Letters, 34 (8). 515-517 doi:10.1063/1.90847
 
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