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Dabney, M. S., Parilla, P. A., Gedvilas, L. M., Mahan, A. H., Ginley, D. S. (2009) Altering the nucleation of thermally annealed hydrogenated amorphous silicon with laser processing. Applied Physics Letters, 95 (25). 251902pp. doi:10.1063/1.3259654

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Reference TypeJournal (article/letter/editorial)
TitleAltering the nucleation of thermally annealed hydrogenated amorphous silicon with laser processing
JournalApplied Physics Letters
AuthorsDabney, M. S.Author
Parilla, P. A.Author
Gedvilas, L. M.Author
Mahan, A. H.Author
Ginley, D. S.Author
Year2009 (December 21)Volume95
Issue25
PublisherAIP Publishing
DOIdoi:10.1063/1.3259654Search in ResearchGate
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Mindat Ref. ID8580069Long-form Identifiermindat:1:5:8580069:6
GUID0
Full ReferenceDabney, M. S., Parilla, P. A., Gedvilas, L. M., Mahan, A. H., Ginley, D. S. (2009) Altering the nucleation of thermally annealed hydrogenated amorphous silicon with laser processing. Applied Physics Letters, 95 (25). 251902pp. doi:10.1063/1.3259654
Plain TextDabney, M. S., Parilla, P. A., Gedvilas, L. M., Mahan, A. H., Ginley, D. S. (2009) Altering the nucleation of thermally annealed hydrogenated amorphous silicon with laser processing. Applied Physics Letters, 95 (25). 251902pp. doi:10.1063/1.3259654
In(2009, December) Applied Physics Letters Vol. 95 (25) AIP Publishing

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Dabney, M. S., van Hest, M. F. A. M., Mahan, A. H., Ginley, D. S. (2013) Nucleation rate reduction through stress relief of thermally annealed hydrogenated amorphous silicon films. Journal of Applied Physics, 113 (17). 173509pp. doi:10.1063/1.4803686
Dabney, M. S., van Hest, M. F. A. M., Mahan, A. H., Ginley, D. S. (2013) Publisher's Note: ā€œNucleation rate reduction through stress relief of thermally annealed hydrogenated amorphous silicon filmsā€ [J. Appl. Phys. 113, 173509 (2013)]. Journal of Applied Physics, 114 (1). 19902pp. doi:10.1063/1.4811548
Mahan, A. H., Dabney, M. S., Reedy, R. C., Molina, D., Ginley, D. S. (2012) The use of optical microscopy to examine crystallite nucleation and growth in thermally annealed plasma enhanced chemical vapor deposition and hot wire chemical vapor deposition a-Si:H films. Journal of Applied Physics, 111 (10). 103501pp. doi:10.1063/1.4712045
Mahan, A. H., Dabney, M. S., Molina Piper, D., Nemeth, W. (2014) The effect of film tensile stress on crystallite nucleation and growth in thermally annealed a-Si:H. Journal of Applied Physics, 115 (8). 83502pp. doi:10.1063/1.4865943
Warmsingh, C., Yoshida, Y., Readey, D. W., Teplin, C. W., Perkins, J. D., Parilla, P. A., Gedvilas, L. M., Keyes, B. M., Ginley, D. S. (2004) High-mobility transparent conducting Mo-doped In2O3 thin films by pulsed laser deposition. Journal of Applied Physics, 95 (7). 3831-3833 doi:10.1063/1.1646468
Young, David L., Stradins, Paul, Xu, Yueqin, Gedvilas, Lynn, Reedy, Bob, Mahan, A. H., Branz, Howard M., Wang, Qi, Williamson, D. L. (2006) Rapid solid-phase crystallization of high-rate, hot-wire chemical-vapor-deposited hydrogenated amorphous silicon. Applied Physics Letters, 89 (16). 161910pp. doi:10.1063/1.2361163
Mahan, A. H., Biswas, R., Gedvilas, L. M., Williamson, D. L., Pan, B. C. (2004) On the influence of short and medium range order on the material band gap in hydrogenated amorphous silicon. Journal of Applied Physics, 96 (7). 3818-3826 doi:10.1063/1.1772876
Bevolo, A. J., Albers, M. L., Shanks, H. R., Shinar, J. (1987) Hydrogen motion in thermally annealed sputterā€deposited hydrogenated amorphous silicon. Journal of Applied Physics, 62 (4). 1240-1244 doi:10.1063/1.339675
van Hest, M. F. A. M., Dabney, M. S., Perkins, J. D., Ginley, D. S., Taylor, M. P. (2005) Titanium-doped indium oxide: A high-mobility transparent conductor. Applied Physics Letters, 87 (3). 32111pp. doi:10.1063/1.1995957
Su, Tining, Taylor, P. C., Chen, Shenlin, Crandall, R. S., Mahan, A. H. (2000) Ortho-molecular hydrogen in hydrogenated amorphous silicon. Applied Physics Letters, 76 (5). 565-567 doi:10.1063/1.125818
Mahan, A. H., Gedvilas, L. M., Webb, J. D. (2000) Siā€“H bonding in low hydrogen content amorphous silicon films as probed by infrared spectroscopy and x-ray diffraction. Journal of Applied Physics, 87 (4). 1650-1658 doi:10.1063/1.372073
 
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