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Gan, H. D., Ikeda, S., Shiga, W., Hayakawa, J., Miura, K., Yamamoto, H., Hasegawa, H., Matsukura, F., Ohkubo, T., Hono, K., Ohno, H. (2010) Tunnel magnetoresistance properties and film structures of double MgO barrier magnetic tunnel junctions. Applied Physics Letters, 96 (19). 192507pp. doi:10.1063/1.3429594

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Reference TypeJournal (article/letter/editorial)
TitleTunnel magnetoresistance properties and film structures of double MgO barrier magnetic tunnel junctions
JournalApplied Physics Letters
AuthorsGan, H. D.Author
Ikeda, S.Author
Shiga, W.Author
Hayakawa, J.Author
Miura, K.Author
Yamamoto, H.Author
Hasegawa, H.Author
Matsukura, F.Author
Ohkubo, T.Author
Hono, K.Author
Ohno, H.Author
Year2010 (May 10)Volume96
Issue19
PublisherAIP Publishing
DOIdoi:10.1063/1.3429594Search in ResearchGate
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Mindat Ref. ID8583422Long-form Identifiermindat:1:5:8583422:2
GUID0
Full ReferenceGan, H. D., Ikeda, S., Shiga, W., Hayakawa, J., Miura, K., Yamamoto, H., Hasegawa, H., Matsukura, F., Ohkubo, T., Hono, K., Ohno, H. (2010) Tunnel magnetoresistance properties and film structures of double MgO barrier magnetic tunnel junctions. Applied Physics Letters, 96 (19). 192507pp. doi:10.1063/1.3429594
Plain TextGan, H. D., Ikeda, S., Shiga, W., Hayakawa, J., Miura, K., Yamamoto, H., Hasegawa, H., Matsukura, F., Ohkubo, T., Hono, K., Ohno, H. (2010) Tunnel magnetoresistance properties and film structures of double MgO barrier magnetic tunnel junctions. Applied Physics Letters, 96 (19). 192507pp. doi:10.1063/1.3429594
In(2010, May) Applied Physics Letters Vol. 96 (19) AIP Publishing


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