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Ren, H., Cheng, S. L., Nishi, Y., Shohet, J. L. (2010) Effects of vacuum ultraviolet and ultraviolet irradiation on ultrathin hafnium-oxide dielectric layers on (100)Si as measured with electron-spin resonance. Applied Physics Letters, 96 (19). 192904pp. doi:10.1063/1.3430570

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Reference TypeJournal (article/letter/editorial)
TitleEffects of vacuum ultraviolet and ultraviolet irradiation on ultrathin hafnium-oxide dielectric layers on (100)Si as measured with electron-spin resonance
JournalApplied Physics Letters
AuthorsRen, H.Author
Cheng, S. L.Author
Nishi, Y.Author
Shohet, J. L.Author
Year2010 (May 10)Volume96
Issue19
PublisherAIP Publishing
DOIdoi:10.1063/1.3430570Search in ResearchGate
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Mindat Ref. ID8583456Long-form Identifiermindat:1:5:8583456:9
GUID0
Full ReferenceRen, H., Cheng, S. L., Nishi, Y., Shohet, J. L. (2010) Effects of vacuum ultraviolet and ultraviolet irradiation on ultrathin hafnium-oxide dielectric layers on (100)Si as measured with electron-spin resonance. Applied Physics Letters, 96 (19). 192904pp. doi:10.1063/1.3430570
Plain TextRen, H., Cheng, S. L., Nishi, Y., Shohet, J. L. (2010) Effects of vacuum ultraviolet and ultraviolet irradiation on ultrathin hafnium-oxide dielectric layers on (100)Si as measured with electron-spin resonance. Applied Physics Letters, 96 (19). 192904pp. doi:10.1063/1.3430570
In(2010, May) Applied Physics Letters Vol. 96 (19) AIP Publishing

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Sinha, H., Lauer, J. L., Nichols, M. T., Antonelli, G. A., Nishi, Y., Shohet, J. L. (2010) Effect of vacuum ultraviolet and ultraviolet Irradiation on capacitance-voltage characteristics of low-k-porous organosilicate dielectrics. Applied Physics Letters, 96 (5). 52901pp. doi:10.1063/1.3306729
Zheng, H., Ryan, E. T., Nishi, Y., Shohet, J. L. (2014) Effect of vacuum-ultraviolet irradiation on the dielectric constant of low-k organosilicate dielectrics. Applied Physics Letters, 105 (20). 202902pp. doi:10.1063/1.4901742
Zheng, H., Guo, X., Pei, D., Ryan, E. T., Nishi, Y., Shohet, J. L. (2015) Effects of vacuum ultraviolet irradiation on trapped charges and leakage currents of low-k organosilicate dielectrics. Applied Physics Letters, 106 (19). 192905pp. doi:10.1063/1.4921271
Guo, X., King, S. W., Zheng, H., Xue, P., Nishi, Y., Shohet, J. L. (2015) Effects of vacuum-ultraviolet irradiation on copper penetration into low-k dielectrics under bias-temperature stress. Applied Physics Letters, 106 (1). 12904pp. doi:10.1063/1.4905462
Pei, D., Xue, P., Li, W., Guo, X., Lin, Y. H., Fung, H. S., Chen, C. C., Nishi, Y., Shohet, J. L. (2016) The effect of vacuum ultraviolet irradiation on the time-dependent dielectric breakdown of organosilicate dielectrics. Applied Physics Letters, 109 (12). 122905pp. doi:10.1063/1.4962949
Zheng, H., King, S. W., Ryan, V., Nishi, Y., Shohet, J. L. (2014) Bandgap measurements of low-k porous organosilicate dielectrics using vacuum ultraviolet irradiation. Applied Physics Letters, 104 (6). 62904pp. doi:10.1063/1.4865407
Ren, H., Nichols, M. T., Jiang, G., Antonelli, G. A., Nishi, Y., Shohet, J. L. (2011) Defects in low-k organosilicate glass and their response to processing as measured with electron-spin resonance. Applied Physics Letters, 98 (10). 102903pp. doi:10.1063/1.3562307
Upadhyaya, G. S., Shohet, J. L., Lauer, J. L. (2005) Monte Carlo simulation of the effects of vacuum-ultraviolet radiation on dielectric materials. Applied Physics Letters, 86 (10). 102101pp. doi:10.1063/1.1879100
Upadhyaya, G. S., Shohet, J. L. (2007) Comparison of the vacuum-ultraviolet radiation response of HfO2∕SiO2∕Si dielectric stacks with SiO2∕Si. Applied Physics Letters, 90 (7). 72904pp. doi:10.1063/1.2591371
Ren, H., Sinha, H., Sehgal, A., Nichols, M. T., Antonelli, G. A., Nishi, Y., Shohet, J. L. (2010) Surface potential due to charge accumulation during vacuum ultraviolet exposure for high-k and low-k dielectrics. Applied Physics Letters, 97 (7). 72901pp. doi:10.1063/1.3481079
 
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