Zhang, B., Shrestha, S., Green, M. A., Conibeer, G. (2010) Size controlled synthesis of Ge nanocrystals in SiO2 at temperatures below 400 °C using magnetron sputtering. Applied Physics Letters, 96 (26). 261901pp. doi:10.1063/1.3457864
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Size controlled synthesis of Ge nanocrystals in SiO2 at temperatures below 400 °C using magnetron sputtering | ||
| Journal | Applied Physics Letters | ||
| Authors | Zhang, B. | Author | |
| Shrestha, S. | Author | ||
| Green, M. A. | Author | ||
| Conibeer, G. | Author | ||
| Year | 2010 (June 28) | Volume | 96 |
| Issue | 26 | ||
| Publisher | AIP Publishing | ||
| DOI | doi:10.1063/1.3457864Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 8584704 | Long-form Identifier | mindat:1:5:8584704:0 |
| GUID | 0 | ||
| Full Reference | Zhang, B., Shrestha, S., Green, M. A., Conibeer, G. (2010) Size controlled synthesis of Ge nanocrystals in SiO2 at temperatures below 400 °C using magnetron sputtering. Applied Physics Letters, 96 (26). 261901pp. doi:10.1063/1.3457864 | ||
| Plain Text | Zhang, B., Shrestha, S., Green, M. A., Conibeer, G. (2010) Size controlled synthesis of Ge nanocrystals in SiO2 at temperatures below 400 °C using magnetron sputtering. Applied Physics Letters, 96 (26). 261901pp. doi:10.1063/1.3457864 | ||
| In | (2010, June) Applied Physics Letters Vol. 96 (26) AIP Publishing | ||
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