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Chen, Yu-Chun, Chang, Ting-Chang, Li, Hung-Wei, Chen, Shih-Ching, Lu, Jin, Chung, Wan-Fang, Tai, Ya-Hsiang, Tseng, Tseung-Yuen (2010) Bias-induced oxygen adsorption in zinc tin oxide thin film transistors under dynamic stress. Applied Physics Letters, 96 (26). 262104pp. doi:10.1063/1.3457996

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Reference TypeJournal (article/letter/editorial)
TitleBias-induced oxygen adsorption in zinc tin oxide thin film transistors under dynamic stress
JournalApplied Physics Letters
AuthorsChen, Yu-ChunAuthor
Chang, Ting-ChangAuthor
Li, Hung-WeiAuthor
Chen, Shih-ChingAuthor
Lu, JinAuthor
Chung, Wan-FangAuthor
Tai, Ya-HsiangAuthor
Tseng, Tseung-YuenAuthor
Year2010 (June 28)Volume96
Issue26
PublisherAIP Publishing
DOIdoi:10.1063/1.3457996Search in ResearchGate
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Mindat Ref. ID8584720Long-form Identifiermindat:1:5:8584720:8
GUID0
Full ReferenceChen, Yu-Chun, Chang, Ting-Chang, Li, Hung-Wei, Chen, Shih-Ching, Lu, Jin, Chung, Wan-Fang, Tai, Ya-Hsiang, Tseng, Tseung-Yuen (2010) Bias-induced oxygen adsorption in zinc tin oxide thin film transistors under dynamic stress. Applied Physics Letters, 96 (26). 262104pp. doi:10.1063/1.3457996
Plain TextChen, Yu-Chun, Chang, Ting-Chang, Li, Hung-Wei, Chen, Shih-Ching, Lu, Jin, Chung, Wan-Fang, Tai, Ya-Hsiang, Tseng, Tseung-Yuen (2010) Bias-induced oxygen adsorption in zinc tin oxide thin film transistors under dynamic stress. Applied Physics Letters, 96 (26). 262104pp. doi:10.1063/1.3457996
In(2010, June) Applied Physics Letters Vol. 96 (26) AIP Publishing

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