Deleruyelle, Damien, Muller, Christophe, Amouroux, Julien, Müller, Robert (2010) Electrical nanocharacterization of copper tetracyanoquinodimethane layers dedicated to resistive random access memories. Applied Physics Letters, 96 (26). 263504pp. doi:10.1063/1.3458596
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Electrical nanocharacterization of copper tetracyanoquinodimethane layers dedicated to resistive random access memories | ||
Journal | Applied Physics Letters | ||
Authors | Deleruyelle, Damien | Author | |
Muller, Christophe | Author | ||
Amouroux, Julien | Author | ||
Müller, Robert | Author | ||
Year | 2010 (June 28) | Volume | 96 |
Issue | 26 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.3458596Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 8584725 | Long-form Identifier | mindat:1:5:8584725:3 |
GUID | 0 | ||
Full Reference | Deleruyelle, Damien, Muller, Christophe, Amouroux, Julien, Müller, Robert (2010) Electrical nanocharacterization of copper tetracyanoquinodimethane layers dedicated to resistive random access memories. Applied Physics Letters, 96 (26). 263504pp. doi:10.1063/1.3458596 | ||
Plain Text | Deleruyelle, Damien, Muller, Christophe, Amouroux, Julien, Müller, Robert (2010) Electrical nanocharacterization of copper tetracyanoquinodimethane layers dedicated to resistive random access memories. Applied Physics Letters, 96 (26). 263504pp. doi:10.1063/1.3458596 | ||
In | (2010, June) Applied Physics Letters Vol. 96 (26) AIP Publishing |
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