Blum, I., Portavoce, A., Chow, L., Mangelinck, D., Hoummada, K., Tellouche, G., Carron, V. (2010) B diffusion in implanted Ni2Si and NiSi layers. Applied Physics Letters, 96 (5). 54102pp. doi:10.1063/1.3303988
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | B diffusion in implanted Ni2Si and NiSi layers | ||
| Journal | Applied Physics Letters | ||
| Authors | Blum, I. | Author | |
| Portavoce, A. | Author | ||
| Chow, L. | Author | ||
| Mangelinck, D. | Author | ||
| Hoummada, K. | Author | ||
| Tellouche, G. | Author | ||
| Carron, V. | Author | ||
| Year | 2010 (February) | Volume | 96 |
| Issue | 5 | ||
| Publisher | AIP Publishing | ||
| DOI | doi:10.1063/1.3303988Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 8585330 | Long-form Identifier | mindat:1:5:8585330:6 |
| GUID | 0 | ||
| Full Reference | Blum, I., Portavoce, A., Chow, L., Mangelinck, D., Hoummada, K., Tellouche, G., Carron, V. (2010) B diffusion in implanted Ni2Si and NiSi layers. Applied Physics Letters, 96 (5). 54102pp. doi:10.1063/1.3303988 | ||
| Plain Text | Blum, I., Portavoce, A., Chow, L., Mangelinck, D., Hoummada, K., Tellouche, G., Carron, V. (2010) B diffusion in implanted Ni2Si and NiSi layers. Applied Physics Letters, 96 (5). 54102pp. doi:10.1063/1.3303988 | ||
| In | (2010, February) Applied Physics Letters Vol. 96 (5) AIP Publishing | ||
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