Bachmann, Julien, Zierold, Robert, Chong, Yuen Tung, Hauert, Roland, Sturm, Chris, Schmidt-Grund, Rüdiger, Rheinländer, Bernd, Grundmann, Marius, Gösele, Ulrich, Nielsch, Kornelius (2008) A Practical, Self-Catalytic, Atomic Layer Deposition of Silicon Dioxide. Angewandte Chemie International Edition, 47 (33). 6177-6179 doi:10.1002/anie.200800245
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | A Practical, Self-Catalytic, Atomic Layer Deposition of Silicon Dioxide | ||
Journal | Angewandte Chemie International Edition | ||
Authors | Bachmann, Julien | Author | |
Zierold, Robert | Author | ||
Chong, Yuen Tung | Author | ||
Hauert, Roland | Author | ||
Sturm, Chris | Author | ||
Schmidt-Grund, Rüdiger | Author | ||
Rheinländer, Bernd | Author | ||
Grundmann, Marius | Author | ||
Gösele, Ulrich | Author | ||
Nielsch, Kornelius | Author | ||
Year | 2008 (August 4) | Volume | 47 |
Issue | 33 | ||
Publisher | Wiley | ||
DOI | doi:10.1002/anie.200800245Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 8585981 | Long-form Identifier | mindat:1:5:8585981:4 |
GUID | 0 | ||
Full Reference | Bachmann, Julien, Zierold, Robert, Chong, Yuen Tung, Hauert, Roland, Sturm, Chris, Schmidt-Grund, Rüdiger, Rheinländer, Bernd, Grundmann, Marius, Gösele, Ulrich, Nielsch, Kornelius (2008) A Practical, Self-Catalytic, Atomic Layer Deposition of Silicon Dioxide. Angewandte Chemie International Edition, 47 (33). 6177-6179 doi:10.1002/anie.200800245 | ||
Plain Text | Bachmann, Julien, Zierold, Robert, Chong, Yuen Tung, Hauert, Roland, Sturm, Chris, Schmidt-Grund, Rüdiger, Rheinländer, Bernd, Grundmann, Marius, Gösele, Ulrich, Nielsch, Kornelius (2008) A Practical, Self-Catalytic, Atomic Layer Deposition of Silicon Dioxide. Angewandte Chemie International Edition, 47 (33). 6177-6179 doi:10.1002/anie.200800245 | ||
In | (2008, August) Angewandte Chemie International Edition Vol. 47 (33) Wiley |
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