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Xie, Dan, Han, Xueguang, Li, Rui, Ren, Tianling, Liu, Litian, Zhao, Yonggang (2010) Characteristics of Pt/BiFeO3/TiO2/Si capacitors with TiO2 layer formed by liquid-delivery metal organic chemical vapor deposition. Applied Physics Letters, 97 (17). 172901pp. doi:10.1063/1.3490712

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Reference TypeJournal (article/letter/editorial)
TitleCharacteristics of Pt/BiFeO3/TiO2/Si capacitors with TiO2 layer formed by liquid-delivery metal organic chemical vapor deposition
JournalApplied Physics Letters
AuthorsXie, DanAuthor
Han, XueguangAuthor
Li, RuiAuthor
Ren, TianlingAuthor
Liu, LitianAuthor
Zhao, YonggangAuthor
Year2010 (October 25)Volume97
Issue17
PublisherAIP Publishing
DOIdoi:10.1063/1.3490712Search in ResearchGate
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Mindat Ref. ID8587550Long-form Identifiermindat:1:5:8587550:2
GUID0
Full ReferenceXie, Dan, Han, Xueguang, Li, Rui, Ren, Tianling, Liu, Litian, Zhao, Yonggang (2010) Characteristics of Pt/BiFeO3/TiO2/Si capacitors with TiO2 layer formed by liquid-delivery metal organic chemical vapor deposition. Applied Physics Letters, 97 (17). 172901pp. doi:10.1063/1.3490712
Plain TextXie, Dan, Han, Xueguang, Li, Rui, Ren, Tianling, Liu, Litian, Zhao, Yonggang (2010) Characteristics of Pt/BiFeO3/TiO2/Si capacitors with TiO2 layer formed by liquid-delivery metal organic chemical vapor deposition. Applied Physics Letters, 97 (17). 172901pp. doi:10.1063/1.3490712
In(2010, October) Applied Physics Letters Vol. 97 (17) AIP Publishing

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Xie, Dan, Zang, Yongyuan, Luo, Yafeng, Han, Xueguang, Ren, Tianling, Liu, Litian (2009) Structural, ferroelectric, dielectric, and magnetic properties of BiFeO3/Bi3.15Nd0.85Ti3O12 multilayer films derived by chemical solution deposition. Journal of Applied Physics, 105 (8). 84109pp. doi:10.1063/1.3110074
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Xie, Dan, Zhang, Zhigang, Ren, Tianling, Liu, Litian (2006) Characteristics of Fatigue Induced by Distribution of Defect Charges in SrBi2Ta2O9Capacitors. Japanese Journal of Applied Physics, 45 (12) 9143-9145 doi:10.1143/jjap.45.9143
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Richter, J. H., Karlsson, P. G., Sandell, A. (2008) Electronic structure of a laterally graded ZrO2–TiO2 film on Si(100) prepared by metal-organic chemical vapor deposition in ultrahigh vacuum. Journal of Applied Physics, 103 (9). 94109pp. doi:10.1063/1.2924427
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