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Chen, Te-Chih, Chang, Ting-Chang, Hsieh, Tien-Yu, Tsai, Chih-Tsung, Chen, Shih-Ching, Lin, Chia-Sheng, Hung, Ming-Chin, Tu, Chun-Hao, Chang, Jiun-Jye, Chen, Po-Lun (2010) Light-induced instability of an InGaZnO thin film transistor with and without SiOx passivation layer formed by plasma-enhanced-chemical-vapor-deposition. Applied Physics Letters, 97 (19). 192103pp. doi:10.1063/1.3514251

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Reference TypeJournal (article/letter/editorial)
TitleLight-induced instability of an InGaZnO thin film transistor with and without SiOx passivation layer formed by plasma-enhanced-chemical-vapor-deposition
JournalApplied Physics Letters
AuthorsChen, Te-ChihAuthor
Chang, Ting-ChangAuthor
Hsieh, Tien-YuAuthor
Tsai, Chih-TsungAuthor
Chen, Shih-ChingAuthor
Lin, Chia-ShengAuthor
Hung, Ming-ChinAuthor
Tu, Chun-HaoAuthor
Chang, Jiun-JyeAuthor
Chen, Po-LunAuthor
Year2010 (November 8)Volume97
Issue19
PublisherAIP Publishing
DOIdoi:10.1063/1.3514251Search in ResearchGate
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Mindat Ref. ID8587963Long-form Identifiermindat:1:5:8587963:2
GUID0
Full ReferenceChen, Te-Chih, Chang, Ting-Chang, Hsieh, Tien-Yu, Tsai, Chih-Tsung, Chen, Shih-Ching, Lin, Chia-Sheng, Hung, Ming-Chin, Tu, Chun-Hao, Chang, Jiun-Jye, Chen, Po-Lun (2010) Light-induced instability of an InGaZnO thin film transistor with and without SiOx passivation layer formed by plasma-enhanced-chemical-vapor-deposition. Applied Physics Letters, 97 (19). 192103pp. doi:10.1063/1.3514251
Plain TextChen, Te-Chih, Chang, Ting-Chang, Hsieh, Tien-Yu, Tsai, Chih-Tsung, Chen, Shih-Ching, Lin, Chia-Sheng, Hung, Ming-Chin, Tu, Chun-Hao, Chang, Jiun-Jye, Chen, Po-Lun (2010) Light-induced instability of an InGaZnO thin film transistor with and without SiOx passivation layer formed by plasma-enhanced-chemical-vapor-deposition. Applied Physics Letters, 97 (19). 192103pp. doi:10.1063/1.3514251
In(2010, November) Applied Physics Letters Vol. 97 (19) AIP Publishing


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