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Kekkonen, Ville, Hakola, Antti, Kajava, Timo, Sahramo, Elina, Malm, Jari, Karppinen, Maarit, Ras, Robin H. A. (2010) Self-erasing and rewritable wettability patterns on ZnO thin films. Applied Physics Letters, 97 (4). 44102pp. doi:10.1063/1.3460915

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Reference TypeJournal (article/letter/editorial)
TitleSelf-erasing and rewritable wettability patterns on ZnO thin films
JournalApplied Physics Letters
AuthorsKekkonen, VilleAuthor
Hakola, AnttiAuthor
Kajava, TimoAuthor
Sahramo, ElinaAuthor
Malm, JariAuthor
Karppinen, MaaritAuthor
Ras, Robin H. A.Author
Year2010 (July 26)Volume97
Issue4
PublisherAIP Publishing
DOIdoi:10.1063/1.3460915Search in ResearchGate
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Mindat Ref. ID8589747Long-form Identifiermindat:1:5:8589747:0
GUID0
Full ReferenceKekkonen, Ville, Hakola, Antti, Kajava, Timo, Sahramo, Elina, Malm, Jari, Karppinen, Maarit, Ras, Robin H. A. (2010) Self-erasing and rewritable wettability patterns on ZnO thin films. Applied Physics Letters, 97 (4). 44102pp. doi:10.1063/1.3460915
Plain TextKekkonen, Ville, Hakola, Antti, Kajava, Timo, Sahramo, Elina, Malm, Jari, Karppinen, Maarit, Ras, Robin H. A. (2010) Self-erasing and rewritable wettability patterns on ZnO thin films. Applied Physics Letters, 97 (4). 44102pp. doi:10.1063/1.3460915
In(2010, July) Applied Physics Letters Vol. 97 (4) AIP Publishing

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Malm, Jari, Sahramo, Elina, Karppinen, Maarit, Ras, Robin H. A. (2010) Photo-Controlled Wettability Switching by Conformal Coating of Nanoscale Topographies with Ultrathin Oxide Films. Chemistry of Materials, 22. 3349-3352 doi:10.1021/cm903831c
Ras, Robin H. A., Sahramo, Elina, Malm, Jari, Raula, Janne, Karppinen, Maarit (2008) Blocking the Lateral Film Growth at the Nanoscale in Area-Selective Atomic Layer Deposition. Journal Of The American Chemical Society, 130 (34) 11252-11253 doi:10.1021/ja803471g
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