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Lwin, Z. Z., Pey, K. L., Liu, C., Liu, Q., Zhang, Q., Chen, Y. N., Singh, P. K., Mahapatra, S. (2011) Localized charge trapping and lateral charge diffusion in metal nanocrystal-embedded High-κ/SiO2 gate stack. Applied Physics Letters, 99 (22). 222102pp. doi:10.1063/1.3664220

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Reference TypeJournal (article/letter/editorial)
TitleLocalized charge trapping and lateral charge diffusion in metal nanocrystal-embedded High-κ/SiO2 gate stack
JournalApplied Physics Letters
AuthorsLwin, Z. Z.Author
Pey, K. L.Author
Liu, C.Author
Liu, Q.Author
Zhang, Q.Author
Chen, Y. N.Author
Singh, P. K.Author
Mahapatra, S.Author
Year2011 (November 28)Volume99
Issue22
PublisherAIP Publishing
DOIdoi:10.1063/1.3664220Search in ResearchGate
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Mindat Ref. ID8597914Long-form Identifiermindat:1:5:8597914:5
GUID0
Full ReferenceLwin, Z. Z., Pey, K. L., Liu, C., Liu, Q., Zhang, Q., Chen, Y. N., Singh, P. K., Mahapatra, S. (2011) Localized charge trapping and lateral charge diffusion in metal nanocrystal-embedded High-κ/SiO2 gate stack. Applied Physics Letters, 99 (22). 222102pp. doi:10.1063/1.3664220
Plain TextLwin, Z. Z., Pey, K. L., Liu, C., Liu, Q., Zhang, Q., Chen, Y. N., Singh, P. K., Mahapatra, S. (2011) Localized charge trapping and lateral charge diffusion in metal nanocrystal-embedded High-κ/SiO2 gate stack. Applied Physics Letters, 99 (22). 222102pp. doi:10.1063/1.3664220
In(2011, November) Applied Physics Letters Vol. 99 (22) AIP Publishing

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