Heo, Sung, Tahir, Dahlang, Chung, Jae Gwan, Lee, Jae Cheol, Kim, KiHong, Lee, Junho, Lee, Hyung-Ik, Park, Gyeong Su, Oh, Suhk Kun, Kang, Hee Jae, Choi, Pyungho, Choi, Byoung-Deog (2015) Band alignment of atomic layer deposited (HfZrO4)1βx(SiO2)x gate dielectrics on Si (100). Applied Physics Letters, 107 (18). 182101pp. doi:10.1063/1.4934567
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Band alignment of atomic layer deposited (HfZrO4)1βx(SiO2)x gate dielectrics on Si (100) | ||
Journal | Applied Physics Letters | ||
Authors | Heo, Sung | Author | |
Tahir, Dahlang | Author | ||
Chung, Jae Gwan | Author | ||
Lee, Jae Cheol | Author | ||
Kim, KiHong | Author | ||
Lee, Junho | Author | ||
Lee, Hyung-Ik | Author | ||
Park, Gyeong Su | Author | ||
Oh, Suhk Kun | Author | ||
Kang, Hee Jae | Author | ||
Choi, Pyungho | Author | ||
Choi, Byoung-Deog | Author | ||
Year | 2015 (November 2) | Volume | 107 |
Issue | 18 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.4934567Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 8636706 | Long-form Identifier | mindat:1:5:8636706:4 |
GUID | 0 | ||
Full Reference | Heo, Sung, Tahir, Dahlang, Chung, Jae Gwan, Lee, Jae Cheol, Kim, KiHong, Lee, Junho, Lee, Hyung-Ik, Park, Gyeong Su, Oh, Suhk Kun, Kang, Hee Jae, Choi, Pyungho, Choi, Byoung-Deog (2015) Band alignment of atomic layer deposited (HfZrO4)1βx(SiO2)x gate dielectrics on Si (100). Applied Physics Letters, 107 (18). 182101pp. doi:10.1063/1.4934567 | ||
Plain Text | Heo, Sung, Tahir, Dahlang, Chung, Jae Gwan, Lee, Jae Cheol, Kim, KiHong, Lee, Junho, Lee, Hyung-Ik, Park, Gyeong Su, Oh, Suhk Kun, Kang, Hee Jae, Choi, Pyungho, Choi, Byoung-Deog (2015) Band alignment of atomic layer deposited (HfZrO4)1βx(SiO2)x gate dielectrics on Si (100). Applied Physics Letters, 107 (18). 182101pp. doi:10.1063/1.4934567 | ||
In | (2015, November) Applied Physics Letters Vol. 107 (18) AIP Publishing |
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