(2019) Characterization of Ge ions implantation in Sb2Te3 thin films for high speed phase change memory application. Applied Physics Letters, 115 (10). 103105pp. doi:10.1063/1.5109178
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Characterization of Ge ions implantation in Sb2Te3 thin films for high speed phase change memory application | ||
Journal | Applied Physics Letters | ||
Year | 2019 (September 2) | Volume | 115 |
Issue | 10 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.5109178Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 8658003 | Long-form Identifier | mindat:1:5:8658003:6 |
GUID | 0 | ||
Full Reference | (2019) Characterization of Ge ions implantation in Sb2Te3 thin films for high speed phase change memory application. Applied Physics Letters, 115 (10). 103105pp. doi:10.1063/1.5109178 | ||
Plain Text | (2019) Characterization of Ge ions implantation in Sb2Te3 thin films for high speed phase change memory application. Applied Physics Letters, 115 (10). 103105pp. doi:10.1063/1.5109178 | ||
In | (2019, September) Applied Physics Letters Vol. 115 (10) AIP Publishing |
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