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Field, M R, McCulloch, D G, Lim, S N H, Anders, A, Keast, V J, Burgess, R W (2008) The electronic structure of tungsten oxide thin films prepared by pulsed cathodic arc deposition and plasma-assisted pulsed magnetron sputtering. Journal of Physics: Condensed Matter, 20 (17). 175216pp. doi:10.1088/0953-8984/20/17/175216

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Reference TypeJournal (article/letter/editorial)
TitleThe electronic structure of tungsten oxide thin films prepared by pulsed cathodic arc deposition and plasma-assisted pulsed magnetron sputtering
JournalJournal of Physics: Condensed Matter
AuthorsField, M RAuthor
McCulloch, D GAuthor
Lim, S N HAuthor
Anders, AAuthor
Keast, V JAuthor
Burgess, R WAuthor
Year2008 (April 30)Volume20
Issue17
PublisherIOP Publishing
DOIdoi:10.1088/0953-8984/20/17/175216Search in ResearchGate
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Mindat Ref. ID8708404Long-form Identifiermindat:1:5:8708404:3
GUID0
Full ReferenceField, M R, McCulloch, D G, Lim, S N H, Anders, A, Keast, V J, Burgess, R W (2008) The electronic structure of tungsten oxide thin films prepared by pulsed cathodic arc deposition and plasma-assisted pulsed magnetron sputtering. Journal of Physics: Condensed Matter, 20 (17). 175216pp. doi:10.1088/0953-8984/20/17/175216
Plain TextField, M R, McCulloch, D G, Lim, S N H, Anders, A, Keast, V J, Burgess, R W (2008) The electronic structure of tungsten oxide thin films prepared by pulsed cathodic arc deposition and plasma-assisted pulsed magnetron sputtering. Journal of Physics: Condensed Matter, 20 (17). 175216pp. doi:10.1088/0953-8984/20/17/175216
In(2008, April) Journal of Physics: Condensed Matter Vol. 20 (17) IOP Publishing

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