Bollanti, S., Di Lazzaro, P., Flora, F., Mezi, L., Murra, D., Torre, A. (2006) Conventional and modified Schwarzschild objective for EUV lithography: design relations. Applied Physics B, 85 (4). 603-610 doi:10.1007/s00340-006-2405-9
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Conventional and modified Schwarzschild objective for EUV lithography: design relations | ||
Journal | Applied Physics B | ||
Authors | Bollanti, S. | Author | |
Di Lazzaro, P. | Author | ||
Flora, F. | Author | ||
Mezi, L. | Author | ||
Murra, D. | Author | ||
Torre, A. | Author | ||
Year | 2006 (November 10) | Volume | 85 |
Issue | 4 | ||
Publisher | Springer Science and Business Media LLC | ||
DOI | doi:10.1007/s00340-006-2405-9Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 9019596 | Long-form Identifier | mindat:1:5:9019596:9 |
GUID | 0 | ||
Full Reference | Bollanti, S., Di Lazzaro, P., Flora, F., Mezi, L., Murra, D., Torre, A. (2006) Conventional and modified Schwarzschild objective for EUV lithography: design relations. Applied Physics B, 85 (4). 603-610 doi:10.1007/s00340-006-2405-9 | ||
Plain Text | Bollanti, S., Di Lazzaro, P., Flora, F., Mezi, L., Murra, D., Torre, A. (2006) Conventional and modified Schwarzschild objective for EUV lithography: design relations. Applied Physics B, 85 (4). 603-610 doi:10.1007/s00340-006-2405-9 | ||
In | (2006, November) Applied Physics B Vol. 85 (4) Springer Science and Business Media LLC |
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