Andreev, D V, Bondarenko, G G, Andreev, V V, Stolyarov, A A (2016) Modification of thin oxide films of MOS structure by high-field injection and irradiation. IOP Conference Series: Materials Science and Engineering, 110. 12041pp. doi:10.1088/1757-899x/110/1/012041
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Modification of thin oxide films of MOS structure by high-field injection and irradiation | ||
Journal | IOP Conference Series: Materials Science and Engineering | ||
Authors | Andreev, D V | Author | |
Bondarenko, G G | Author | ||
Andreev, V V | Author | ||
Stolyarov, A A | Author | ||
Year | 2016 (February 23) | Volume | 110 |
Publisher | IOP Publishing | ||
DOI | doi:10.1088/1757-899x/110/1/012041Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 9780470 | Long-form Identifier | mindat:1:5:9780470:1 |
GUID | 0 | ||
Full Reference | Andreev, D V, Bondarenko, G G, Andreev, V V, Stolyarov, A A (2016) Modification of thin oxide films of MOS structure by high-field injection and irradiation. IOP Conference Series: Materials Science and Engineering, 110. 12041pp. doi:10.1088/1757-899x/110/1/012041 | ||
Plain Text | Andreev, D V, Bondarenko, G G, Andreev, V V, Stolyarov, A A (2016) Modification of thin oxide films of MOS structure by high-field injection and irradiation. IOP Conference Series: Materials Science and Engineering, 110. 12041pp. doi:10.1088/1757-899x/110/1/012041 | ||
In | (n.d.) IOP Conference Series: Materials Science and Engineering Vol. 110. IOP Publishing |
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