Avrov, D.D., Dorozhkin, Sergey I., Lebedev, Andrew O., Rastegaev, V.P., Tairov, Yuri M. (2000) Silicon Carbide Substrates for Epitaxial Growth of Aluminium Nitride by Chloride-Transport Process. Materials Science Forum, 338. 1515-1518 doi:10.4028/www.scientific.net/msf.338-342.1515
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Silicon Carbide Substrates for Epitaxial Growth of Aluminium Nitride by Chloride-Transport Process | ||
Journal | Materials Science Forum | ||
Authors | Avrov, D.D. | Author | |
Dorozhkin, Sergey I. | Author | ||
Lebedev, Andrew O. | Author | ||
Rastegaev, V.P. | Author | ||
Tairov, Yuri M. | Author | ||
Year | 2000 (May) | Volume | 338 |
Publisher | Trans Tech Publications, Ltd. | ||
DOI | doi:10.4028/www.scientific.net/msf.338-342.1515Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 9849706 | Long-form Identifier | mindat:1:5:9849706:7 |
GUID | 0 | ||
Full Reference | Avrov, D.D., Dorozhkin, Sergey I., Lebedev, Andrew O., Rastegaev, V.P., Tairov, Yuri M. (2000) Silicon Carbide Substrates for Epitaxial Growth of Aluminium Nitride by Chloride-Transport Process. Materials Science Forum, 338. 1515-1518 doi:10.4028/www.scientific.net/msf.338-342.1515 | ||
Plain Text | Avrov, D.D., Dorozhkin, Sergey I., Lebedev, Andrew O., Rastegaev, V.P., Tairov, Yuri M. (2000) Silicon Carbide Substrates for Epitaxial Growth of Aluminium Nitride by Chloride-Transport Process. Materials Science Forum, 338. 1515-1518 doi:10.4028/www.scientific.net/msf.338-342.1515 | ||
In | (2000) Materials Science Forum Vol. 338. Trans Tech Publications, Ltd. |
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