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Chuang, F.Y., Lin, C.T., Sun, C.Y., Cheng, H.F., Lin, I.N. (1996) Electrical properties of laser deposited YBa2Cu3O7βˆ’Ξ΄ films on silicon wafers. Applied Surface Science, 92. 452-456 doi:10.1016/0169-4332(95)00275-8

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Reference TypeJournal (article/letter/editorial)
TitleElectrical properties of laser deposited YBa2Cu3O7βˆ’Ξ΄ films on silicon wafers
JournalApplied Surface Science
AuthorsChuang, F.Y.Author
Lin, C.T.Author
Sun, C.Y.Author
Cheng, H.F.Author
Lin, I.N.Author
Year1996 (February)Volume92
PublisherElsevier BV
DOIdoi:10.1016/0169-4332(95)00275-8Search in ResearchGate
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Mindat Ref. ID9898005Long-form Identifiermindat:1:5:9898005:3
GUID0
Full ReferenceChuang, F.Y., Lin, C.T., Sun, C.Y., Cheng, H.F., Lin, I.N. (1996) Electrical properties of laser deposited YBa2Cu3O7βˆ’Ξ΄ films on silicon wafers. Applied Surface Science, 92. 452-456 doi:10.1016/0169-4332(95)00275-8
Plain TextChuang, F.Y., Lin, C.T., Sun, C.Y., Cheng, H.F., Lin, I.N. (1996) Electrical properties of laser deposited YBa2Cu3O7βˆ’Ξ΄ films on silicon wafers. Applied Surface Science, 92. 452-456 doi:10.1016/0169-4332(95)00275-8
In(n.d.) Applied Surface Science Vol. 92. Elsevier BV


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