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Hamakawa, Yoshihiro (1999) Recent advances in amorphous and microcrystalline silicon basis devices for optoelectronic applications. Applied Surface Science, 142. 215-226 doi:10.1016/s0169-4332(98)00883-6

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Reference TypeJournal (article/letter/editorial)
TitleRecent advances in amorphous and microcrystalline silicon basis devices for optoelectronic applications
JournalApplied Surface Science
AuthorsHamakawa, YoshihiroAuthor
Year1999 (April)Volume142
PublisherElsevier BV
DOIdoi:10.1016/s0169-4332(98)00883-6Search in ResearchGate
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Mindat Ref. ID9901059Long-form Identifiermindat:1:5:9901059:1
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Full ReferenceHamakawa, Yoshihiro (1999) Recent advances in amorphous and microcrystalline silicon basis devices for optoelectronic applications. Applied Surface Science, 142. 215-226 doi:10.1016/s0169-4332(98)00883-6
Plain TextHamakawa, Yoshihiro (1999) Recent advances in amorphous and microcrystalline silicon basis devices for optoelectronic applications. Applied Surface Science, 142. 215-226 doi:10.1016/s0169-4332(98)00883-6
In(n.d.) Applied Surface Science Vol. 142. Elsevier BV

See Also

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Hamakawa, Yoshihiro (1988) Current status of a-Si technology and its applications to optoelectronic devices. Applied Surface Science, 33. 705-718 doi:10.1016/0169-4332(88)90371-6
Toyama, Toshihiko, Matsui, Tetsuyuki, Okamoto, Hiroaki, Hamakawa, Yoshihiro (1997) High electric field electroluminescence in hydrogenated amorphous silicon carbide alloys. Applied Surface Science, 113. 504-508 doi:10.1016/s0169-4332(96)00871-9
Hamakawa, Yoshihiro, Koma, Atsushi (1997) Preface. Applied Surface Science, 113. doi:10.1016/s0169-4332(97)80030-x
Hamakawa, Yoshihiro (1996) A technological evolution from bulk crystalline age to multilayered thin film age in optoelectronic devices. Applied Surface Science, 92. 1-10 doi:10.1016/0169-4332(95)00194-8
Ehara, Takashi (1997) Electron spin resonance study of nitrogen-doped microcrystalline silicon and amorphous silicon. Applied Surface Science, 113. 126-129 doi:10.1016/s0169-4332(96)00894-x
Toyama, Toshihiko, Ouchida, Takashi, Okamoto, Hiroaki, Hamakawa, Yoshihiro (1997) Optical and structural studies of nanocrystalline silicon thin film grown by rapid thermal annealing. Applied Surface Science, 113. 130-134 doi:10.1016/s0169-4332(96)00892-6
(1999) Index. Applied Surface Science, 142. 642-650 doi:10.1016/s0169-4332(99)00147-6
Majamaa, T, Kilpelä, O, Novikov, S, Sinkkonen, J (1999) Annealing of ultrathin silicon dioxide layers plasma oxidized in ultrahigh vacuum. Applied Surface Science, 142. 351-355 doi:10.1016/s0169-4332(98)00674-6
Kwo, Jon-Lian, Yokoyama, Meiso, Lin, I-Nan (1999) Effects of composition on field emission character of tetrahedral amorphous carbon. Applied Surface Science, 142. 521-526 doi:10.1016/s0169-4332(98)00688-6
Hamakawa, Yoshihiro (1983) Recent advances in amorphous silicon solar cells and their technologies. Journal of Non-Crystalline Solids, 59. 1265-1272 doi:10.1016/0022-3093(83)90397-6
Sloan, D.W, Blass, P.M, White, J.M (1999) Surface chemistry of precursors for film growth: pentakisdimethylamido tantalum. Applied Surface Science, 143. 142-152 doi:10.1016/s0169-4332(98)00777-6
 
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