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Mårtensson, Per, Larsson, Karin, Carlsson, Jan-Otto (1999) Atomic layer epitaxy of copper: an ab initio investigation of the CuCl/H2 process. Applied Surface Science, 148. 9-16 doi:10.1016/s0169-4332(99)00141-5

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Reference TypeJournal (article/letter/editorial)
TitleAtomic layer epitaxy of copper: an ab initio investigation of the CuCl/H2 process
JournalApplied Surface Science
AuthorsMårtensson, PerAuthor
Larsson, KarinAuthor
Carlsson, Jan-OttoAuthor
Year1999 (June)Volume148
PublisherElsevier BV
DOIdoi:10.1016/s0169-4332(99)00141-5Search in ResearchGate
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Mindat Ref. ID9901382Long-form Identifiermindat:1:5:9901382:6
GUID0
Full ReferenceMårtensson, Per, Larsson, Karin, Carlsson, Jan-Otto (1999) Atomic layer epitaxy of copper: an ab initio investigation of the CuCl/H2 process. Applied Surface Science, 148. 9-16 doi:10.1016/s0169-4332(99)00141-5
Plain TextMårtensson, Per, Larsson, Karin, Carlsson, Jan-Otto (1999) Atomic layer epitaxy of copper: an ab initio investigation of the CuCl/H2 process. Applied Surface Science, 148. 9-16 doi:10.1016/s0169-4332(99)00141-5
In(n.d.) Applied Surface Science Vol. 148. Elsevier BV

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Mårtensson, Per, Larsson, Karin, Carlsson, Jan-Otto (2000) Atomic layer epitaxy of copper: an ab initio investigation of the CuCl/H2 process. Applied Surface Science, 157. 92-100 doi:10.1016/s0169-4332(99)00519-x
Mårtensson, Per, Larsson, Karin, Carlsson, Jan-Otto (1998) Atomic layer epitaxy of copper: an ab initio investigation of the CuCl/H2 process. Applied Surface Science, 136. 137-146 doi:10.1016/s0169-4332(98)00330-4
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Larsson, Karin, Carlsson, Jan-Otto (1999) Surface migration during diamond growth studied by molecular orbital calculations. Physical Review B, 59 (12) 8315-8322 doi:10.1103/physrevb.59.8315
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Sugahara, Satoshi, Matsumura, Masakiyo (1997) Modeling of germanium atomic-layer-epitaxy. Applied Surface Science, 112. 176-186 doi:10.1016/s0169-4332(96)01027-6
Hirose, Shingo, Yamaura, Masaaki, Munekata, Hiro (1999) Atomic layer epitaxy of AlP and (AlP)n(GaP)n superlattice using ethyldimethylamine alane as a new aluminum source. Applied Surface Science, 150. 89-94 doi:10.1016/s0169-4332(99)00226-3
(1999) Index. Applied Surface Science, 144. 726-747 doi:10.1016/s0169-4332(99)00160-9
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