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Garcı́a-Méndez, M, Castillón, F.F, Hirata, G.A, Farı́as, M.H, Beamson, G (2000) XPS and HRTEM characterization of cobalt–nickel silicide thin films. Applied Surface Science, 161. 61-73 doi:10.1016/s0169-4332(00)00122-7

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Reference TypeJournal (article/letter/editorial)
TitleXPS and HRTEM characterization of cobalt–nickel silicide thin films
JournalApplied Surface Science
AuthorsGarcı́a-Méndez, MAuthor
Castillón, F.FAuthor
Hirata, G.AAuthor
Farı́as, M.HAuthor
Beamson, GAuthor
Year2000 (July)Volume161
PublisherElsevier BV
DOIdoi:10.1016/s0169-4332(00)00122-7Search in ResearchGate
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Mindat Ref. ID9901992Long-form Identifiermindat:1:5:9901992:7
GUID0
Full ReferenceGarcı́a-Méndez, M, Castillón, F.F, Hirata, G.A, Farı́as, M.H, Beamson, G (2000) XPS and HRTEM characterization of cobalt–nickel silicide thin films. Applied Surface Science, 161. 61-73 doi:10.1016/s0169-4332(00)00122-7
Plain TextGarcı́a-Méndez, M, Castillón, F.F, Hirata, G.A, Farı́as, M.H, Beamson, G (2000) XPS and HRTEM characterization of cobalt–nickel silicide thin films. Applied Surface Science, 161. 61-73 doi:10.1016/s0169-4332(00)00122-7
In(n.d.) Applied Surface Science Vol. 161. Elsevier BV

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