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Hong, Lu-Sheng, Jeng, Muh-Gueng (2000) Incubation time for chemical vapor deposition of copper from hexafluoroacetylacetonate–copper(I)–vinyltrimethoxysilane. Applied Surface Science, 161. 149-154 doi:10.1016/s0169-4332(00)00278-6

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Reference TypeJournal (article/letter/editorial)
TitleIncubation time for chemical vapor deposition of copper from hexafluoroacetylacetonate–copper(I)–vinyltrimethoxysilane
JournalApplied Surface Science
AuthorsHong, Lu-ShengAuthor
Jeng, Muh-GuengAuthor
Year2000 (July)Volume161
PublisherElsevier BV
DOIdoi:10.1016/s0169-4332(00)00278-6Search in ResearchGate
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Mindat Ref. ID9902004Long-form Identifiermindat:1:5:9902004:8
GUID0
Full ReferenceHong, Lu-Sheng, Jeng, Muh-Gueng (2000) Incubation time for chemical vapor deposition of copper from hexafluoroacetylacetonate–copper(I)–vinyltrimethoxysilane. Applied Surface Science, 161. 149-154 doi:10.1016/s0169-4332(00)00278-6
Plain TextHong, Lu-Sheng, Jeng, Muh-Gueng (2000) Incubation time for chemical vapor deposition of copper from hexafluoroacetylacetonate–copper(I)–vinyltrimethoxysilane. Applied Surface Science, 161. 149-154 doi:10.1016/s0169-4332(00)00278-6
In(n.d.) Applied Surface Science Vol. 161. Elsevier BV

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Hong, Lu Sheng, Jeng, Muh Gueng (2000) Film Growth Modeling of Metal Organic Chemical Vapor Deposition of Copper from Copper(I)-Hexafluoroacetylacetonate Vinyltrimethoxysilane in the Presence of Hydrogen. Japanese Journal of Applied Physics, 39. 1908-1912 doi:10.1143/jjap.39.1908
Cheng, T.Q, Griffiths, K, Norton, P.R, Puddephatt, R.J (1998) XPS studies of copper deposition from 1,5-cyclooctadiene-copper(I)-hexafluoroacetylacetonate on Si(111). Applied Surface Science, 126. 303-308 doi:10.1016/s0169-4332(97)00583-7
Hong, Lu-Sheng, Lin, Mei-Zu (1997) Atomic Force Microscopy Study of the Initial Growth of Copper Films by Chemical Vapor Deposition from Hexafluoroacetylacetonate-copper(I)-trimethylvinylsilane: An Indication of a Surface Electron Transfer Reaction. Japanese Journal of Applied Physics, 36. doi:10.1143/jjap.36.l711
(2000) Editorial. Applied Surface Science, 154. doi:10.1016/s0169-4332(00)00005-2
Su, Yea-Yang, Shemenski, Robert M (2000) The role of oxide structure on copper wire to the rubber adhesion. Applied Surface Science, 161. 355-364 doi:10.1016/s0169-4332(00)00158-6
Dulot, F, Eugène, J, Kierren, B, Malterre, D (2000) STM-TIP induced surface diffusion of copper on copper (100). Applied Surface Science, 162. 86-93 doi:10.1016/s0169-4332(00)00175-6
(2000) Index. Applied Surface Science, 154. 716-723 doi:10.1016/s0169-4332(00)00002-7
(2000) Index. Applied Surface Science, 154. 724-747 doi:10.1016/s0169-4332(00)00003-9
(2000) Index. Applied Surface Science, 161. 515-519 doi:10.1016/s0169-4332(00)00505-5
(2000) Index. Applied Surface Science, 161. 520-534 doi:10.1016/s0169-4332(00)00506-7
Tóth, Z., Mechler, Á., Heszler, P. (2000) Local laser-assisted chemical vapor deposition of diamond. Applied Surface Science, 168. 5-8 doi:10.1016/s0169-4332(00)00563-8
 
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