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Amasuga, Hirotaka, Nakamura, Manami, Mera, Yutaka, Maeda, Koji (2002) The atomic processes of ultraviolet laser-induced etching of chlorinated silicon (1 1 1) surface. Applied Surface Science, 197. 577-580 doi:10.1016/s0169-4332(02)00340-9

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Reference TypeJournal (article/letter/editorial)
TitleThe atomic processes of ultraviolet laser-induced etching of chlorinated silicon (1 1 1) surface
JournalApplied Surface Science
AuthorsAmasuga, HirotakaAuthor
Nakamura, ManamiAuthor
Mera, YutakaAuthor
Maeda, KojiAuthor
Year2002 (September)Volume197
PublisherElsevier BV
DOIdoi:10.1016/s0169-4332(02)00340-9Search in ResearchGate
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Mindat Ref. ID9904148Long-form Identifiermindat:1:5:9904148:5
GUID0
Full ReferenceAmasuga, Hirotaka, Nakamura, Manami, Mera, Yutaka, Maeda, Koji (2002) The atomic processes of ultraviolet laser-induced etching of chlorinated silicon (1 1 1) surface. Applied Surface Science, 197. 577-580 doi:10.1016/s0169-4332(02)00340-9
Plain TextAmasuga, Hirotaka, Nakamura, Manami, Mera, Yutaka, Maeda, Koji (2002) The atomic processes of ultraviolet laser-induced etching of chlorinated silicon (1 1 1) surface. Applied Surface Science, 197. 577-580 doi:10.1016/s0169-4332(02)00340-9
In(n.d.) Applied Surface Science Vol. 197. Elsevier BV

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