Maeda, Keiji (2003) Process-induced defects and potential distribution in nearly ideal Au/Si Schottky barriers. Applied Surface Science, 216. 198-202 doi:10.1016/s0169-4332(03)00437-9
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Process-induced defects and potential distribution in nearly ideal Au/Si Schottky barriers | ||
Journal | Applied Surface Science | ||
Authors | Maeda, Keiji | Author | |
Year | 2003 (June) | Volume | 216 |
Publisher | Elsevier BV | ||
DOI | doi:10.1016/s0169-4332(03)00437-9Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 9905293 | Long-form Identifier | mindat:1:5:9905293:1 |
GUID | 0 | ||
Full Reference | Maeda, Keiji (2003) Process-induced defects and potential distribution in nearly ideal Au/Si Schottky barriers. Applied Surface Science, 216. 198-202 doi:10.1016/s0169-4332(03)00437-9 | ||
Plain Text | Maeda, Keiji (2003) Process-induced defects and potential distribution in nearly ideal Au/Si Schottky barriers. Applied Surface Science, 216. 198-202 doi:10.1016/s0169-4332(03)00437-9 | ||
In | (n.d.) Applied Surface Science Vol. 216. Elsevier BV |
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