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Oran, U, Ünveren, E, Wirth, T, Unger, W.E.S (2004) Poly-dimethyl-siloxane (PDMS) contamination of polystyrene (PS) oligomers samples: a comparison of time-of-flight static secondary ion mass spectrometry (TOF-SSIMS) and X-ray photoelectron spectroscopy (XPS) results. Applied Surface Science, 227. 318-324 doi:10.1016/j.apsusc.2003.12.008

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Reference TypeJournal (article/letter/editorial)
TitlePoly-dimethyl-siloxane (PDMS) contamination of polystyrene (PS) oligomers samples: a comparison of time-of-flight static secondary ion mass spectrometry (TOF-SSIMS) and X-ray photoelectron spectroscopy (XPS) results
JournalApplied Surface Science
AuthorsOran, UAuthor
Ünveren, EAuthor
Wirth, TAuthor
Unger, W.E.SAuthor
Year2004 (April)Volume227
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2003.12.008Search in ResearchGate
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Mindat Ref. ID9905985Long-form Identifiermindat:1:5:9905985:5
GUID0
Full ReferenceOran, U, Ünveren, E, Wirth, T, Unger, W.E.S (2004) Poly-dimethyl-siloxane (PDMS) contamination of polystyrene (PS) oligomers samples: a comparison of time-of-flight static secondary ion mass spectrometry (TOF-SSIMS) and X-ray photoelectron spectroscopy (XPS) results. Applied Surface Science, 227. 318-324 doi:10.1016/j.apsusc.2003.12.008
Plain TextOran, U, Ünveren, E, Wirth, T, Unger, W.E.S (2004) Poly-dimethyl-siloxane (PDMS) contamination of polystyrene (PS) oligomers samples: a comparison of time-of-flight static secondary ion mass spectrometry (TOF-SSIMS) and X-ray photoelectron spectroscopy (XPS) results. Applied Surface Science, 227. 318-324 doi:10.1016/j.apsusc.2003.12.008
In(n.d.) Applied Surface Science Vol. 227. Elsevier BV

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France, Richard M., O'Toole, Liam, Short, Robert D., Pollicino, Nino (1995) X-ray photoelectron spectroscopy (XPS) and time-of-flight secondary ion mass spectrometry (ToF-SIMS) analysis of UV-exposed polystyrene. Macromolecular Chemistry and Physics, 196. 3695-3705 doi:10.1002/macp.1995.021961122
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