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Paik, Namwoong (2005) Characteristics of Cu films prepared using a magnetron sputter type negative ion source (MSNIS). Applied Surface Science, 252. 1812-1817 doi:10.1016/j.apsusc.2005.03.204

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Reference TypeJournal (article/letter/editorial)
TitleCharacteristics of Cu films prepared using a magnetron sputter type negative ion source (MSNIS)
JournalApplied Surface Science
AuthorsPaik, NamwoongAuthor
Year2005 (December)Volume252
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2005.03.204Search in ResearchGate
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Mindat Ref. ID9909082Long-form Identifiermindat:1:5:9909082:5
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Full ReferencePaik, Namwoong (2005) Characteristics of Cu films prepared using a magnetron sputter type negative ion source (MSNIS). Applied Surface Science, 252. 1812-1817 doi:10.1016/j.apsusc.2005.03.204
Plain TextPaik, Namwoong (2005) Characteristics of Cu films prepared using a magnetron sputter type negative ion source (MSNIS). Applied Surface Science, 252. 1812-1817 doi:10.1016/j.apsusc.2005.03.204
In(n.d.) Applied Surface Science Vol. 252. Elsevier BV

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Paik, Namwoong (2005) Characteristics of Cu films prepared using a magnetron sputter type negative ion source (MSNIS). Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 229 (3). 436-442 doi:10.1016/j.nimb.2004.12.123
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