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Bernstorff, S., Dubček, P., Pivac, B., Kovačević, I., Sassella, A., Borghesi, A. (2006) XRR and GISAXS study of silicon oxynitride films. Applied Surface Science, 253. 33-37 doi:10.1016/j.apsusc.2006.05.068

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Reference TypeJournal (article/letter/editorial)
TitleXRR and GISAXS study of silicon oxynitride films
JournalApplied Surface Science
AuthorsBernstorff, S.Author
Dubček, P.Author
Pivac, B.Author
Kovačević, I.Author
Sassella, A.Author
Borghesi, A.Author
Year2006 (October)Volume253
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2006.05.068Search in ResearchGate
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Mindat Ref. ID9909275Long-form Identifiermindat:1:5:9909275:3
GUID0
Full ReferenceBernstorff, S., Dubček, P., Pivac, B., Kovačević, I., Sassella, A., Borghesi, A. (2006) XRR and GISAXS study of silicon oxynitride films. Applied Surface Science, 253. 33-37 doi:10.1016/j.apsusc.2006.05.068
Plain TextBernstorff, S., Dubček, P., Pivac, B., Kovačević, I., Sassella, A., Borghesi, A. (2006) XRR and GISAXS study of silicon oxynitride films. Applied Surface Science, 253. 33-37 doi:10.1016/j.apsusc.2006.05.068
In(n.d.) Applied Surface Science Vol. 253. Elsevier BV

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Capan, I., Bak-Misiuk, J., Pivac, B., Dubček, P., Misiuk, A., Bernstorff, S., Romanowski, P. (2011) Defects in silicon introduced by helium implantation and subsequent annealing. Radiation Physics and Chemistry, 80. 1099-1103 doi:10.1016/j.radphyschem.2011.02.006
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