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Hodroj, A., Roussel, H., Crisci, A., Robaut, F., Gottlieb, U., Deschanvres, J.L. (2006) Density, thickness and composition measurements of TiO2SiO2 thin films by coupling X-ray reflectometry, ellipsometry and electron probe microanalysis-X. Applied Surface Science, 253. 363-366 doi:10.1016/j.apsusc.2006.06.014

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Reference TypeJournal (article/letter/editorial)
TitleDensity, thickness and composition measurements of TiO2SiO2 thin films by coupling X-ray reflectometry, ellipsometry and electron probe microanalysis-X
JournalApplied Surface Science
AuthorsHodroj, A.Author
Roussel, H.Author
Crisci, A.Author
Robaut, F.Author
Gottlieb, U.Author
Deschanvres, J.L.Author
Year2006 (October)Volume253
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2006.06.014Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID9909340Long-form Identifiermindat:1:5:9909340:6
GUID0
Full ReferenceHodroj, A., Roussel, H., Crisci, A., Robaut, F., Gottlieb, U., Deschanvres, J.L. (2006) Density, thickness and composition measurements of TiO2SiO2 thin films by coupling X-ray reflectometry, ellipsometry and electron probe microanalysis-X. Applied Surface Science, 253. 363-366 doi:10.1016/j.apsusc.2006.06.014
Plain TextHodroj, A., Roussel, H., Crisci, A., Robaut, F., Gottlieb, U., Deschanvres, J.L. (2006) Density, thickness and composition measurements of TiO2SiO2 thin films by coupling X-ray reflectometry, ellipsometry and electron probe microanalysis-X. Applied Surface Science, 253. 363-366 doi:10.1016/j.apsusc.2006.06.014
In(n.d.) Applied Surface Science Vol. 253. Elsevier BV

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