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Flores, M., Huerta, L., Escamilla, R., Andrade, E., Muhl, S. (2007) Effect of substrate bias voltage on corrosion of TiN/Ti multilayers deposited by magnetron sputtering. Applied Surface Science, 253. 7192-7196 doi:10.1016/j.apsusc.2007.02.203

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Reference TypeJournal (article/letter/editorial)
TitleEffect of substrate bias voltage on corrosion of TiN/Ti multilayers deposited by magnetron sputtering
JournalApplied Surface Science
AuthorsFlores, M.Author
Huerta, L.Author
Escamilla, R.Author
Andrade, E.Author
Muhl, S.Author
Year2007 (June)Volume253
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2007.02.203Search in ResearchGate
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Mindat Ref. ID9909814Long-form Identifiermindat:1:5:9909814:6
GUID0
Full ReferenceFlores, M., Huerta, L., Escamilla, R., Andrade, E., Muhl, S. (2007) Effect of substrate bias voltage on corrosion of TiN/Ti multilayers deposited by magnetron sputtering. Applied Surface Science, 253. 7192-7196 doi:10.1016/j.apsusc.2007.02.203
Plain TextFlores, M., Huerta, L., Escamilla, R., Andrade, E., Muhl, S. (2007) Effect of substrate bias voltage on corrosion of TiN/Ti multilayers deposited by magnetron sputtering. Applied Surface Science, 253. 7192-7196 doi:10.1016/j.apsusc.2007.02.203
In(n.d.) Applied Surface Science Vol. 253. Elsevier BV

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