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Lim, Wantae, Voss, Lars, Khanna, Rohit, Gila, B.P., Norton, D.P., Pearton, S.J., Ren, F. (2006) Dry etching of bulk single-crystal ZnO in CH 4 /H 2 -based plasma chemistries. Applied Surface Science, 253. 889-894 doi:10.1016/j.apsusc.2006.01.037

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Reference TypeJournal (article/letter/editorial)
TitleDry etching of bulk single-crystal ZnO in CH 4 /H 2 -based plasma chemistries
JournalApplied Surface Science
AuthorsLim, WantaeAuthor
Voss, LarsAuthor
Khanna, RohitAuthor
Gila, B.P.Author
Norton, D.P.Author
Pearton, S.J.Author
Ren, F.Author
Year2006 (November)Volume253
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2006.01.037Search in ResearchGate
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Mindat Ref. ID9910104Long-form Identifiermindat:1:5:9910104:2
GUID0
Full ReferenceLim, Wantae, Voss, Lars, Khanna, Rohit, Gila, B.P., Norton, D.P., Pearton, S.J., Ren, F. (2006) Dry etching of bulk single-crystal ZnO in CH 4 /H 2 -based plasma chemistries. Applied Surface Science, 253. 889-894 doi:10.1016/j.apsusc.2006.01.037
Plain TextLim, Wantae, Voss, Lars, Khanna, Rohit, Gila, B.P., Norton, D.P., Pearton, S.J., Ren, F. (2006) Dry etching of bulk single-crystal ZnO in CH 4 /H 2 -based plasma chemistries. Applied Surface Science, 253. 889-894 doi:10.1016/j.apsusc.2006.01.037
In(n.d.) Applied Surface Science Vol. 253. Elsevier BV

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