Prabhu, Vivek M., Sambasivan, Sharadha, Fischer, Daniel, Sundberg, Linda K., Allen, Robert D. (2006) Quantitative depth profiling of photoacid generators in photoresist materials by near-edge X-ray absorption fine structure spectroscopy. Applied Surface Science, 253. 1010-1014 doi:10.1016/j.apsusc.2006.03.089
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Quantitative depth profiling of photoacid generators in photoresist materials by near-edge X-ray absorption fine structure spectroscopy | ||
Journal | Applied Surface Science | ||
Authors | Prabhu, Vivek M. | Author | |
Sambasivan, Sharadha | Author | ||
Fischer, Daniel | Author | ||
Sundberg, Linda K. | Author | ||
Allen, Robert D. | Author | ||
Year | 2006 (November) | Volume | 253 |
Publisher | Elsevier BV | ||
DOI | doi:10.1016/j.apsusc.2006.03.089Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 9910117 | Long-form Identifier | mindat:1:5:9910117:6 |
GUID | 0 | ||
Full Reference | Prabhu, Vivek M., Sambasivan, Sharadha, Fischer, Daniel, Sundberg, Linda K., Allen, Robert D. (2006) Quantitative depth profiling of photoacid generators in photoresist materials by near-edge X-ray absorption fine structure spectroscopy. Applied Surface Science, 253. 1010-1014 doi:10.1016/j.apsusc.2006.03.089 | ||
Plain Text | Prabhu, Vivek M., Sambasivan, Sharadha, Fischer, Daniel, Sundberg, Linda K., Allen, Robert D. (2006) Quantitative depth profiling of photoacid generators in photoresist materials by near-edge X-ray absorption fine structure spectroscopy. Applied Surface Science, 253. 1010-1014 doi:10.1016/j.apsusc.2006.03.089 | ||
In | (n.d.) Applied Surface Science Vol. 253. Elsevier BV |
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