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Agarwal, Garima, Sharma, Pratibha, Jain, I.P. (2006) SHI induced silicide formation and surface morphology at Co/Si system. Applied Surface Science, 253. 1165-1169 doi:10.1016/j.apsusc.2006.01.059

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Reference TypeJournal (article/letter/editorial)
TitleSHI induced silicide formation and surface morphology at Co/Si system
JournalApplied Surface Science
AuthorsAgarwal, GarimaAuthor
Sharma, PratibhaAuthor
Jain, I.P.Author
Year2006 (November)Volume253
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2006.01.059Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID9910329Long-form Identifiermindat:1:5:9910329:9
GUID0
Full ReferenceAgarwal, Garima, Sharma, Pratibha, Jain, I.P. (2006) SHI induced silicide formation and surface morphology at Co/Si system. Applied Surface Science, 253. 1165-1169 doi:10.1016/j.apsusc.2006.01.059
Plain TextAgarwal, Garima, Sharma, Pratibha, Jain, I.P. (2006) SHI induced silicide formation and surface morphology at Co/Si system. Applied Surface Science, 253. 1165-1169 doi:10.1016/j.apsusc.2006.01.059
In(n.d.) Applied Surface Science Vol. 253. Elsevier BV

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Agarwal, Shivani, Ganesan, V, Tyagi, AK, Jain, IP (2006) Effect of annealing on magnetic properties and silicide formation at Co/Si interface. Bulletin of Materials Science, 29. 647-651 doi:10.1007/s12034-006-0018-x
Ji, Ting, Song, Junqiang, Zhou, Wei, Cai, Qun (2007) Si growth effects on the formation of Er silicide nanostructures. Applied Surface Science, 253. 3184-3189 doi:10.1016/j.apsusc.2006.07.009
Agarwal, Garima, Jain, Ankur, Agarwal, Shivani, Kabiraj, D., Jain, I. P. (2006) Structural and electrical properties of swift heavy ion beam irradiated Co/Si interface. Bulletin of Materials Science, 29. 187-191 doi:10.1007/bf02704614
Novaković, M., Popović, M., Zhang, K., Lieb, K.P., Bibić, N. (2014) Silicide phases formation in Co/c-Si and Co/a-Si systems during thermal annealing. Applied Surface Science, 295. 158-163 doi:10.1016/j.apsusc.2014.01.020
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Beimborn, A., Henschel, E., Westphal, C. (2013) Morphology and growth of hafnium silicide on Si(111). Applied Surface Science, 265. 1-3 doi:10.1016/j.apsusc.2012.09.009
 
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