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Liu, Hongyan, Zhang, Riguang, Yan, Ruixia, Wang, Baojun, Xie, Kechang (2011) CH4 dissociation on NiCo (111) surface: A first-principles study. Applied Surface Science, 257. 8955-8964 doi:10.1016/j.apsusc.2011.05.073

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Reference TypeJournal (article/letter/editorial)
TitleCH4 dissociation on NiCo (111) surface: A first-principles study
JournalApplied Surface Science
AuthorsLiu, HongyanAuthor
Zhang, RiguangAuthor
Yan, RuixiaAuthor
Wang, BaojunAuthor
Xie, KechangAuthor
Year2011 (August)Volume257
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2011.05.073Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID9916478Long-form Identifiermindat:1:5:9916478:6
GUID0
Full ReferenceLiu, Hongyan, Zhang, Riguang, Yan, Ruixia, Wang, Baojun, Xie, Kechang (2011) CH4 dissociation on NiCo (111) surface: A first-principles study. Applied Surface Science, 257. 8955-8964 doi:10.1016/j.apsusc.2011.05.073
Plain TextLiu, Hongyan, Zhang, Riguang, Yan, Ruixia, Wang, Baojun, Xie, Kechang (2011) CH4 dissociation on NiCo (111) surface: A first-principles study. Applied Surface Science, 257. 8955-8964 doi:10.1016/j.apsusc.2011.05.073
In(n.d.) Applied Surface Science Vol. 257. Elsevier BV

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