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Li, S.X., Cao, Y.Q., Xu, J., Rui, Y.J., Li, W., Chen, K.J. (2013) Hydrogenated amorphous silicon-carbide thin films with high photo-sensitivity prepared by layer-by-layer hydrogen annealing technique. Applied Surface Science, 270. 287-291 doi:10.1016/j.apsusc.2012.12.176

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Reference TypeJournal (article/letter/editorial)
TitleHydrogenated amorphous silicon-carbide thin films with high photo-sensitivity prepared by layer-by-layer hydrogen annealing technique
JournalApplied Surface Science
AuthorsLi, S.X.Author
Cao, Y.Q.Author
Xu, J.Author
Rui, Y.J.Author
Li, W.Author
Chen, K.J.Author
Year2013 (April)Volume270
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2012.12.176Search in ResearchGate
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Mindat Ref. ID9920170Long-form Identifiermindat:1:5:9920170:4
GUID0
Full ReferenceLi, S.X., Cao, Y.Q., Xu, J., Rui, Y.J., Li, W., Chen, K.J. (2013) Hydrogenated amorphous silicon-carbide thin films with high photo-sensitivity prepared by layer-by-layer hydrogen annealing technique. Applied Surface Science, 270. 287-291 doi:10.1016/j.apsusc.2012.12.176
Plain TextLi, S.X., Cao, Y.Q., Xu, J., Rui, Y.J., Li, W., Chen, K.J. (2013) Hydrogenated amorphous silicon-carbide thin films with high photo-sensitivity prepared by layer-by-layer hydrogen annealing technique. Applied Surface Science, 270. 287-291 doi:10.1016/j.apsusc.2012.12.176
In(n.d.) Applied Surface Science Vol. 270. Elsevier BV

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