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Zhang, Yang, Zhang, Xintong, Wang, Dan, Wan, Fangxu, Liu, Yichun (2017) Protecting hydrogenation-generated oxygen vacancies in BiVO4 photoanode for enhanced water oxidation with conformal ultrathin amorphous TiO2 layer. Applied Surface Science, 403. 389-395 doi:10.1016/j.apsusc.2017.01.195

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Reference TypeJournal (article/letter/editorial)
TitleProtecting hydrogenation-generated oxygen vacancies in BiVO4 photoanode for enhanced water oxidation with conformal ultrathin amorphous TiO2 layer
JournalApplied Surface Science
AuthorsZhang, YangAuthor
Zhang, XintongAuthor
Wang, DanAuthor
Wan, FangxuAuthor
Liu, YichunAuthor
Year2017 (May)Volume403
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2017.01.195Search in ResearchGate
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Mindat Ref. ID9930369Long-form Identifiermindat:1:5:9930369:5
GUID0
Full ReferenceZhang, Yang, Zhang, Xintong, Wang, Dan, Wan, Fangxu, Liu, Yichun (2017) Protecting hydrogenation-generated oxygen vacancies in BiVO4 photoanode for enhanced water oxidation with conformal ultrathin amorphous TiO2 layer. Applied Surface Science, 403. 389-395 doi:10.1016/j.apsusc.2017.01.195
Plain TextZhang, Yang, Zhang, Xintong, Wang, Dan, Wan, Fangxu, Liu, Yichun (2017) Protecting hydrogenation-generated oxygen vacancies in BiVO4 photoanode for enhanced water oxidation with conformal ultrathin amorphous TiO2 layer. Applied Surface Science, 403. 389-395 doi:10.1016/j.apsusc.2017.01.195
In(n.d.) Applied Surface Science Vol. 403. Elsevier BV

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