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Yeo, Seungmin, Nandi, Dip K., Rahul, R., Kim, Tae Hyun, Shong, Bonggeun, Jang, Yujin, Bae, Jong-Seong, Han, Jeong Woo, Kim, Soo-Hyun, Kim, Hyungjun (2018) Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications. Applied Surface Science, 459. 596-605 doi:10.1016/j.apsusc.2018.07.210

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Reference TypeJournal (article/letter/editorial)
TitleLow-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
JournalApplied Surface Science
AuthorsYeo, SeungminAuthor
Nandi, Dip K.Author
Rahul, R.Author
Kim, Tae HyunAuthor
Shong, BonggeunAuthor
Jang, YujinAuthor
Bae, Jong-SeongAuthor
Han, Jeong WooAuthor
Kim, Soo-HyunAuthor
Kim, HyungjunAuthor
Year2018 (November)Volume459
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2018.07.210Search in ResearchGate
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Mindat Ref. ID9935580Long-form Identifiermindat:1:5:9935580:1
GUID0
Full ReferenceYeo, Seungmin, Nandi, Dip K., Rahul, R., Kim, Tae Hyun, Shong, Bonggeun, Jang, Yujin, Bae, Jong-Seong, Han, Jeong Woo, Kim, Soo-Hyun, Kim, Hyungjun (2018) Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications. Applied Surface Science, 459. 596-605 doi:10.1016/j.apsusc.2018.07.210
Plain TextYeo, Seungmin, Nandi, Dip K., Rahul, R., Kim, Tae Hyun, Shong, Bonggeun, Jang, Yujin, Bae, Jong-Seong, Han, Jeong Woo, Kim, Soo-Hyun, Kim, Hyungjun (2018) Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications. Applied Surface Science, 459. 596-605 doi:10.1016/j.apsusc.2018.07.210
In(n.d.) Applied Surface Science Vol. 459. Elsevier BV

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