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Morán-Pedroso, María, Sánchez-Marcos, Jorge, de Andrés, Alicia, Prieto, Carlos (2018) Fluorinated tin oxide (FTO) deposited at room temperature: Influence of hydrogen and oxygen in the sputtering gas on the optical and electrical properties. Applied Surface Science, 459. 349-353 doi:10.1016/j.apsusc.2018.08.011

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Reference TypeJournal (article/letter/editorial)
TitleFluorinated tin oxide (FTO) deposited at room temperature: Influence of hydrogen and oxygen in the sputtering gas on the optical and electrical properties
JournalApplied Surface Science
AuthorsMorán-Pedroso, MaríaAuthor
Sánchez-Marcos, JorgeAuthor
de Andrés, AliciaAuthor
Prieto, CarlosAuthor
Year2018 (November)Volume459
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2018.08.011Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID9935599Long-form Identifiermindat:1:5:9935599:9
GUID0
Full ReferenceMorán-Pedroso, María, Sánchez-Marcos, Jorge, de Andrés, Alicia, Prieto, Carlos (2018) Fluorinated tin oxide (FTO) deposited at room temperature: Influence of hydrogen and oxygen in the sputtering gas on the optical and electrical properties. Applied Surface Science, 459. 349-353 doi:10.1016/j.apsusc.2018.08.011
Plain TextMorán-Pedroso, María, Sánchez-Marcos, Jorge, de Andrés, Alicia, Prieto, Carlos (2018) Fluorinated tin oxide (FTO) deposited at room temperature: Influence of hydrogen and oxygen in the sputtering gas on the optical and electrical properties. Applied Surface Science, 459. 349-353 doi:10.1016/j.apsusc.2018.08.011
In(n.d.) Applied Surface Science Vol. 459. Elsevier BV

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