Nam, Taewook, Lee, Hyunho, Choi, Taejin, Seo, Seunggi, Yoon, Chang Mo, Choi, Yunjung, Jeong, Heonjong, Lingam, Hima K., Chitturi, Venkateswara R., Korolev, Andrey, Ahn, Jong-Hyun, Kim, Hyungjun (2019) Low-temperature, high-growth-rate ALD of SiO2 using aminodisilane precursor. Applied Surface Science, 485. 381-390 doi:10.1016/j.apsusc.2019.03.227
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Low-temperature, high-growth-rate ALD of SiO2 using aminodisilane precursor | ||
| Journal | Applied Surface Science | ||
| Authors | Nam, Taewook | Author | |
| Lee, Hyunho | Author | ||
| Choi, Taejin | Author | ||
| Seo, Seunggi | Author | ||
| Yoon, Chang Mo | Author | ||
| Choi, Yunjung | Author | ||
| Jeong, Heonjong | Author | ||
| Lingam, Hima K. | Author | ||
| Chitturi, Venkateswara R. | Author | ||
| Korolev, Andrey | Author | ||
| Ahn, Jong-Hyun | Author | ||
| Kim, Hyungjun | Author | ||
| Year | 2019 (August) | Volume | 485 |
| Publisher | Elsevier BV | ||
| DOI | doi:10.1016/j.apsusc.2019.03.227Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 9938208 | Long-form Identifier | mindat:1:5:9938208:1 |
| GUID | 0 | ||
| Full Reference | Nam, Taewook, Lee, Hyunho, Choi, Taejin, Seo, Seunggi, Yoon, Chang Mo, Choi, Yunjung, Jeong, Heonjong, Lingam, Hima K., Chitturi, Venkateswara R., Korolev, Andrey, Ahn, Jong-Hyun, Kim, Hyungjun (2019) Low-temperature, high-growth-rate ALD of SiO2 using aminodisilane precursor. Applied Surface Science, 485. 381-390 doi:10.1016/j.apsusc.2019.03.227 | ||
| Plain Text | Nam, Taewook, Lee, Hyunho, Choi, Taejin, Seo, Seunggi, Yoon, Chang Mo, Choi, Yunjung, Jeong, Heonjong, Lingam, Hima K., Chitturi, Venkateswara R., Korolev, Andrey, Ahn, Jong-Hyun, Kim, Hyungjun (2019) Low-temperature, high-growth-rate ALD of SiO2 using aminodisilane precursor. Applied Surface Science, 485. 381-390 doi:10.1016/j.apsusc.2019.03.227 | ||
| In | (n.d.) Applied Surface Science Vol. 485. Elsevier BV | ||
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