Krishtab, M., de Marneffe, J.-F., Armini, S., Meersschaut, J., Bender, H., Wilson, C., De Gendt, S. (2019) Metal barrier induced damage in self-assembly based organosilica low-k dielectrics and its reduction by organic template residues. Applied Surface Science, 485. 170-178 doi:10.1016/j.apsusc.2019.04.083

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Reference Type	Journal (article/letter/editorial)
Title	Metal barrier induced damage in self-assembly based organosilica low-k dielectrics and its reduction by organic template residues
Journal	Applied Surface Science
Authors	Krishtab, M.		Author
	de Marneffe, J.-F.		Author
	Armini, S.		Author
	Meersschaut, J.		Author
	Bender, H.		Author
	Wilson, C.		Author
	De Gendt, S.		Author
Year	2019 (August)	Volume	485
Publisher	Elsevier BV
DOI	doi:10.1016/j.apsusc.2019.04.083Search in ResearchGate
	Generate Citation Formats
Mindat Ref. ID	9938218	Long-form Identifier	mindat:1:5:9938218:8
GUID	0
Full Reference	Krishtab, M., de Marneffe, J.-F., Armini, S., Meersschaut, J., Bender, H., Wilson, C., De Gendt, S. (2019) Metal barrier induced damage in self-assembly based organosilica low-k dielectrics and its reduction by organic template residues. Applied Surface Science, 485. 170-178 doi:10.1016/j.apsusc.2019.04.083
Plain Text	Krishtab, M., de Marneffe, J.-F., Armini, S., Meersschaut, J., Bender, H., Wilson, C., De Gendt, S. (2019) Metal barrier induced damage in self-assembly based organosilica low-k dielectrics and its reduction by organic template residues. Applied Surface Science, 485. 170-178 doi:10.1016/j.apsusc.2019.04.083
In	(n.d.) Applied Surface Science Vol. 485. Elsevier BV

	Krishtab, M., de Marneffe, J.-F., De Gendt, S., Baklanov, M. R. (2017) Plasma induced damage mitigation in spin-on self-assembly based ultra low-k dielectrics using template residues. Applied Physics Letters, 110 (1). 13105pp. doi:10.1063/1.4973474
	Krishtab, M., Afanas'ev, V., Stesmans, A., De Gendt, S. (2017) Leakage current induced by surfactant residues in self-assembly based ultralow-k dielectric materials. Applied Physics Letters, 111 (3). 32908pp. doi:10.1063/1.4995241
	Zhang, L., de Marneffe, J.-F., Heylen, N., Murdoch, G., Tokei, Z., Boemmels, J., De Gendt, S., Baklanov, M. R. (2015) Damage free integration of ultralow-k dielectrics by template replacement approach. Applied Physics Letters, 107 (9). 92901pp. doi:10.1063/1.4930072
	Rezvanov, A., Gornev, E.S., de Marneffe, J.-F., Armini, S. (2019) Area selective grafting of siloxane molecules on low-k dielectric with respect to copper surface. Applied Surface Science, 476. 317-324 doi:10.1016/j.apsusc.2019.01.088
	Vanstreels, K., Krishtab, M., Garcia Gonzalez, L., Armini, S. (2017) Impact of organic linking and terminal groups on the mechanical properties of self-assembly based low-k dielectrics. Applied Physics Letters, 111 (16). 161906pp. doi:10.1063/1.4993088
	Krishtab, Mikhail, Stassen, Ivo, Stassin, Timothée, Cruz, Alexander John, Okudur, Oguzhan Orkut, Armini, Silvia, Wilson, Chris, De Gendt, Stefan, Ameloot, Rob (2019) Vapor-deposited zeolitic imidazolate frameworks as gap-filling ultra-low-k dielectrics. Nature Communications, 10. doi:10.1038/s41467-019-11703-x
	Guo, X., Zheng, H., King, S. W., Afanas'ev, V. V., Baklanov, M. R., de Marneffe, J.-F., Nishi, Y., Shohet, J. L. (2015) Defect-induced bandgap narrowing in low-k dielectrics. Applied Physics Letters, 107 (8). 82903pp. doi:10.1063/1.4929702
	de Marneffe, J.-F., Zhang, L., Heyne, M., Lukaszewicz, M., Porter, S. B., Vajda, F., Rutigliani, V., el Otell, Z., Krishtab, M., Goodyear, A., Cooke, M., Verdonck, P., Baklanov, M. R. (2015) Vacuum ultra-violet damage and damage mitigation for plasma processing of highly porous organosilicate glass dielectrics. Journal of Applied Physics, 118 (13). 133302pp. doi:10.1063/1.4932202
	Sun, Yiting, Krishtab, Mikhail, Mankelevich, Yuri, Zhang, Liping, De Feyter, Steven, Baklanov, Mikhail, Armini, Silvia (2016) Surface-confined activation of ultra low-k dielectrics in CO2 plasma. Applied Physics Letters, 108 (26). 262902pp. doi:10.1063/1.4955021
	Chanson, R., Zhang, L., Naumov, S., Mankelevich, Yu. A., Tillocher, T., Lefaucheux, P., Dussart, R., Gendt, S. De, Marneffe, J.-F. de (2018) Damage-free plasma etching of porous organo-silicate low-k using micro-capillary condensation above −50 °C. Scientific Reports, 8. doi:10.1038/s41598-018-20099-5
	Krishtab, Mikhail, Armini, Silvia, Meersschaut, Johan, De Gendt, Stefan, Ameloot, Rob (2021) Cyclic Plasma Halogenation of Amorphous Carbon for Defect-Free Area-Selective Atomic Layer Deposition of Titanium Oxide. ACS Applied Materials & Interfaces, 13 (27) 32381-32392 doi:10.1021/acsami.1c04405

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