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Li, Xiaolong, Xu, Jian, Lin, Zijie, Qi, Jia, Wang, Peng, Chu, Wei, Fang, Zhiwei, Wang, Zhenhua, Chai, Zhifang, Cheng, Ya (2019) Polarization-insensitive space-selective etching in fused silica induced by picosecond laser irradiation. Applied Surface Science, 485. 188-193 doi:10.1016/j.apsusc.2019.04.211

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Reference TypeJournal (article/letter/editorial)
TitlePolarization-insensitive space-selective etching in fused silica induced by picosecond laser irradiation
JournalApplied Surface Science
AuthorsLi, XiaolongAuthor
Xu, JianAuthor
Lin, ZijieAuthor
Qi, JiaAuthor
Wang, PengAuthor
Chu, WeiAuthor
Fang, ZhiweiAuthor
Wang, ZhenhuaAuthor
Chai, ZhifangAuthor
Cheng, YaAuthor
Year2019 (August)Volume485
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2019.04.211Search in ResearchGate
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Mindat Ref. ID9938250Long-form Identifiermindat:1:5:9938250:4
GUID0
Full ReferenceLi, Xiaolong, Xu, Jian, Lin, Zijie, Qi, Jia, Wang, Peng, Chu, Wei, Fang, Zhiwei, Wang, Zhenhua, Chai, Zhifang, Cheng, Ya (2019) Polarization-insensitive space-selective etching in fused silica induced by picosecond laser irradiation. Applied Surface Science, 485. 188-193 doi:10.1016/j.apsusc.2019.04.211
Plain TextLi, Xiaolong, Xu, Jian, Lin, Zijie, Qi, Jia, Wang, Peng, Chu, Wei, Fang, Zhiwei, Wang, Zhenhua, Chai, Zhifang, Cheng, Ya (2019) Polarization-insensitive space-selective etching in fused silica induced by picosecond laser irradiation. Applied Surface Science, 485. 188-193 doi:10.1016/j.apsusc.2019.04.211
In(n.d.) Applied Surface Science Vol. 485. Elsevier BV

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