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Hayashi, Shinsuke, Hirai, Toshio (1983) Thermal conductivity of chemically vapour-deposited Si3N4-TiN composites. Journal of Materials Science, 18. 3259-3264 doi:10.1007/bf00544150

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Reference TypeJournal (article/letter/editorial)
TitleThermal conductivity of chemically vapour-deposited Si3N4-TiN composites
JournalJournal of Materials Science
AuthorsHayashi, ShinsukeAuthor
Hirai, ToshioAuthor
Year1983 (November)Volume18
PublisherSpringer Science and Business Media LLC
DOIdoi:10.1007/bf00544150Search in ResearchGate
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Mindat Ref. ID9985757Long-form Identifiermindat:1:5:9985757:6
GUID0
Full ReferenceHayashi, Shinsuke, Hirai, Toshio (1983) Thermal conductivity of chemically vapour-deposited Si3N4-TiN composites. Journal of Materials Science, 18. 3259-3264 doi:10.1007/bf00544150
Plain TextHayashi, Shinsuke, Hirai, Toshio (1983) Thermal conductivity of chemically vapour-deposited Si3N4-TiN composites. Journal of Materials Science, 18. 3259-3264 doi:10.1007/bf00544150
In(n.d.) Journal of Materials Science Vol. 18. Springer Science and Business Media LLC

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Hirai, Toshio, Hayashi, Shinsuke (1983) Density and deposition rate of chemically vapour-deposited Si3N4-TiN composites. Journal of Materials Science, 18. 2401-2406 doi:10.1007/bf00541845
Hirai, Toshio, Hayashi, Shinsuke (1982) Preparation and some properties of chemically vapour-deposited Si3N4-TiN composite. Journal of Materials Science, 17. 1320-1328 doi:10.1007/bf00752241
Goto, Takashi, Hirai, Toshio (1983) Etching of chemically vapour-deposited amorphous Si3N4-C composites in HF solution. Journal of Materials Science, 18. 3387-3392 doi:10.1007/bf00544164
Hayashi, Shinsuke, Hirai, Toshio, Hiraga, Kenji, Hirabayashi, Makoto (1982) Microstructure of Si3N4-TiN composites prepared by chemical-vapour deposition. Journal of Materials Science, 17. 3336-3340 doi:10.1007/bf01203503
Goto, Takashi, Hirai, Toshio (1983) D.C. electrical conductivity of amorphous Si3N4-C composites prepared by chemical vapour deposition. Journal of Materials Science, 18. 383-390 doi:10.1007/bf00560626
Goto, Takashi, Hirai, Toshio (1989) Dielectric properties of chemically vapour-deposited Si3N4. Journal of Materials Science, 24. 821-826 doi:10.1007/bf01148763
HIRAGA, K., HIRABAYASHI, M., HAYASHI, S., HIRAI, T. (1983) High-Resolution Electron Microscopy of Chemically Vapor-Deposited beta-Si3N4-TiN Composites. Journal of the American Ceramic Society, 66 (8). 539-542 doi:10.1111/j.1151-2916.1983.tb10088.x
Matsuda, Toshitsugu, Uno, Naoki, Nakae, Hiroyuki, Hirai, Toshio (1986) Synthesis and structure of chemically vapour-deposited boron nitride. Journal of Materials Science, 21. 649-658 doi:10.1007/bf01145537
Lee, Byong-Taek, Hayashi, Shinsuke, Hirai, Toshio, Hiraga, Kenji (1993) Crack Propagation Behavior of CVD Si3N4–TiN Composite Examined by High-Resolution Electron Microscopy. Materials Transactions, JIM, 34. 573-579 doi:10.2320/matertrans1989.34.573
Hirai, Toshio, Niihara, Koichi, Goto, Takashi (1977) Rapid chemical vapour-deposition of Si3N4. Journal of Materials Science, 12. 631-632 doi:10.1007/bf00540292
Niihara, Koichi, Hirai, Toshio (1976) Chemical vapour-deposited silicon nitride. Journal of Materials Science, 11. 593-603 doi:10.1007/bf01209443
 
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