Reference Type | Journal (article/letter/editorial) |
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Title | Chemical vapour deposition of silicon carbide: An X-ray diffraction study |
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Journal | Journal of Materials Science |
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Authors | Sibieude, F. | Author |
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Benezech, G. | Author |
Year | 1988 (May) | Volume | 23 |
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Publisher | Springer Science and Business Media LLC |
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DOI | doi:10.1007/bf01115701Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 9988812 | Long-form Identifier | mindat:1:5:9988812:3 |
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GUID | 0 |
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Full Reference | Sibieude, F., Benezech, G. (1988) Chemical vapour deposition of silicon carbide: An X-ray diffraction study. Journal of Materials Science, 23. 1632-1636 doi:10.1007/bf01115701 |
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Plain Text | Sibieude, F., Benezech, G. (1988) Chemical vapour deposition of silicon carbide: An X-ray diffraction study. Journal of Materials Science, 23. 1632-1636 doi:10.1007/bf01115701 |
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In | (n.d.) Journal of Materials Science Vol. 23. Springer Science and Business Media LLC |
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