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Shen, Yiqun, Hu, Wei, Zhang, Tingwei, Xu, Xiaofeng, Sun, Jian, Wu, Jiada, Ying, Zhifeng, Xu, Ning (2008) Arsenic-doped ZnO films fabricated on silicon substrates by pulsed laser ablation. Materials Science and Engineering: A, 473. 201-205 doi:10.1016/j.msea.2007.03.060

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Reference TypeJournal (article/letter/editorial)
TitleArsenic-doped ZnO films fabricated on silicon substrates by pulsed laser ablation
JournalMaterials Science and Engineering: A
AuthorsShen, YiqunAuthor
Hu, WeiAuthor
Zhang, TingweiAuthor
Xu, XiaofengAuthor
Sun, JianAuthor
Wu, JiadaAuthor
Ying, ZhifengAuthor
Xu, NingAuthor
Year2008 (January)Volume473
PublisherElsevier BV
DOIdoi:10.1016/j.msea.2007.03.060Search in ResearchGate
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Mindat Ref. ID10036739Long-form Identifiermindat:1:5:10036739:7
GUID0
Full ReferenceShen, Yiqun, Hu, Wei, Zhang, Tingwei, Xu, Xiaofeng, Sun, Jian, Wu, Jiada, Ying, Zhifeng, Xu, Ning (2008) Arsenic-doped ZnO films fabricated on silicon substrates by pulsed laser ablation. Materials Science and Engineering: A, 473. 201-205 doi:10.1016/j.msea.2007.03.060
Plain TextShen, Yiqun, Hu, Wei, Zhang, Tingwei, Xu, Xiaofeng, Sun, Jian, Wu, Jiada, Ying, Zhifeng, Xu, Ning (2008) Arsenic-doped ZnO films fabricated on silicon substrates by pulsed laser ablation. Materials Science and Engineering: A, 473. 201-205 doi:10.1016/j.msea.2007.03.060
In(n.d.) Materials Science and Engineering: A Vol. 473. Elsevier BV

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