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Ying, Zhifeng, Tang, Wentao, Hu, Zhigao, Li, Wenwu, Sun, Jian, Xu, Ning, Wu, Jiada (2010) Annealing behaviors of structural, interfacial and optical properties of HfO2 thin films prepared by plasma assisted reactive pulsed laser deposition. Journal of Materials Research, 25 (4) 680-686 doi:10.1557/jmr.2010.0087

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Reference TypeJournal (article/letter/editorial)
TitleAnnealing behaviors of structural, interfacial and optical properties of HfO2 thin films prepared by plasma assisted reactive pulsed laser deposition
JournalJournal of Materials Research
AuthorsYing, ZhifengAuthor
Tang, WentaoAuthor
Hu, ZhigaoAuthor
Li, WenwuAuthor
Sun, JianAuthor
Xu, NingAuthor
Wu, JiadaAuthor
Year2010 (April)Volume25
Issue4
PublisherSpringer Science and Business Media LLC
DOIdoi:10.1557/jmr.2010.0087Search in ResearchGate
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Mindat Ref. ID17103119Long-form Identifiermindat:1:5:17103119:7
GUID0
Full ReferenceYing, Zhifeng, Tang, Wentao, Hu, Zhigao, Li, Wenwu, Sun, Jian, Xu, Ning, Wu, Jiada (2010) Annealing behaviors of structural, interfacial and optical properties of HfO2 thin films prepared by plasma assisted reactive pulsed laser deposition. Journal of Materials Research, 25 (4) 680-686 doi:10.1557/jmr.2010.0087
Plain TextYing, Zhifeng, Tang, Wentao, Hu, Zhigao, Li, Wenwu, Sun, Jian, Xu, Ning, Wu, Jiada (2010) Annealing behaviors of structural, interfacial and optical properties of HfO2 thin films prepared by plasma assisted reactive pulsed laser deposition. Journal of Materials Research, 25 (4) 680-686 doi:10.1557/jmr.2010.0087
In(2010, April) Journal of Materials Research Vol. 25 (4) Springer Science and Business Media LLC

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