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Liu, D. Q., Dang, Z. Y., Breese, M. B. H., Blackwood, D. J. (2014) Influence of Light Ion Irradiation on the Current-Voltage Characteristics of Electrochemical Anodization of p-Type Silicon. Journal of the Electrochemical Society, 161. doi:10.1149/2.055405jes

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Reference TypeJournal (article/letter/editorial)
TitleInfluence of Light Ion Irradiation on the Current-Voltage Characteristics of Electrochemical Anodization of p-Type Silicon
JournalJournal of the Electrochemical Society
AuthorsLiu, D. Q.Author
Dang, Z. Y.Author
Breese, M. B. H.Author
Blackwood, D. J.Author
Year2014Volume161
PublisherThe Electrochemical Society
DOIdoi:10.1149/2.055405jesSearch in ResearchGate
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Mindat Ref. ID12071743Long-form Identifiermindat:1:5:12071743:1
GUID0
Full ReferenceLiu, D. Q., Dang, Z. Y., Breese, M. B. H., Blackwood, D. J. (2014) Influence of Light Ion Irradiation on the Current-Voltage Characteristics of Electrochemical Anodization of p-Type Silicon. Journal of the Electrochemical Society, 161. doi:10.1149/2.055405jes
Plain TextLiu, D. Q., Dang, Z. Y., Breese, M. B. H., Blackwood, D. J. (2014) Influence of Light Ion Irradiation on the Current-Voltage Characteristics of Electrochemical Anodization of p-Type Silicon. Journal of the Electrochemical Society, 161. doi:10.1149/2.055405jes
In(n.d.) Journal of the Electrochemical Society Vol. 161. The Electrochemical Society

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Gui, Y., Blackwood, D. J. (2014) Electrochromic Enhancement of WO3-TiO2Composite Films Produced by Electrochemical Anodization. Journal of the Electrochemical Society, 161. doi:10.1149/2.0631414jes
Mangaiyarkarasi, D., Teo, E. J., Breese, M. B. H., Bettiol, A. A., Blackwood, D. J. (2005) Controlled Shift in Emission Wavelength from Patterned Porous Silicon Using Focused Ion Beam Irradiation. Journal of the Electrochemical Society, 152. doi:10.1149/1.2032347
Breese, M. B. H., Champeaux, F. J. T., Teo, E. J., Bettiol, A. A., Blackwood, D. J. (2006) Hole transport through proton-irradiatedp-type silicon wafers during electrochemical anodization. Physical Review B, 73 (3) doi:10.1103/physrevb.73.035428
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Sharp, D. J. (1980) Effects of Chloride Ion Impurities on the High Voltage Barrier Anodization of Aluminum. Journal of the Electrochemical Society, 127. 1412pp. doi:10.1149/1.2129915
Wijesinghe, T. L. S. L., Li, S. Q., Blackwood, D. J. (2008) Influence of Doping Density on the Current−Voltage Characteristics of p-Type Silicon in Dilute Hydrofluoric Acid. The Journal of Physical Chemistry C, 112 (1). 303-307 doi:10.1021/jp076986h
Dang, Z. Y., Breese, M. B. H., Lin, Y., Tok, E. S., Vittone, E. (2014) Enhanced electrochemical etching of ion irradiated silicon by localized amorphization. Applied Physics Letters, 104 (19). 192108pp. doi:10.1063/1.4876917
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Goldstein, R. M., Pettit, W. J. (1968) Rate Characteristics of Constant Voltage Anodization of Yttrium. Journal of the Electrochemical Society, 115. 979pp. doi:10.1149/1.2411503
Yu, L., Yan, Y. X., Liu, Q., Wang, J., Yang, B., Wang, B., Jing, X. Y., Liu, L. H. (2014) Exfoliation at Room Temperature for Improving Electrochemical Performance for Supercapacitors of Layered MnO2. Journal of the Electrochemical Society, 161. doi:10.1149/2.070311jes
 
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